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Dr. Zhongyan Wang
Engineer
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Publications (1)
Proceedings Article | 7 March 2008 Paper
An approach for nanometer trench and hole formation
Zhongyan Wang, Ming Sun, Xilin Peng, Thomas Boonstra
Proceedings Volume 6924, 692447 (2008) https://doi.org/10.1117/12.772778
KEYWORDS: Atomic layer deposition, Critical dimension metrology, Magnetism, Oxygen, Plasma, Optical lithography, Photomasks, Semiconducting wafers, Chemical mechanical planarization, Nanowires
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