Dr. Harry Rieger Profile

Dr. Harry Rieger

Research Director at JMAR Technologies Inc

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Author

Publications (8)

Proceedings Article | 7 June 2006 Paper

Laser produced x-ray by high brightness and power diode pumped Nd:YAG laser for compact x-ray lithography and microscopy

Harry Rieger

Proceedings Volume 6261, 62610W (2006) https://doi.org/10.1117/12.673015

KEYWORDS: X-rays, X-ray lithography, X-ray microscopy, Amplifiers, Nd:YAG lasers, Laser systems engineering, Semiconductor lasers, Diodes, Optical amplifiers, X-ray lasers

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Proceedings Article | 10 May 2005 Paper

X-ray nanoplasma instruments and tools

S. Bloom, H. Rieger, J. Alwan

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.597119

KEYWORDS: X-rays, Plasma, Spectroscopy, Zone plates, Optical amplifiers, X-ray diffraction, X-ray optics, Diffraction, Laser systems engineering, X-ray sources

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Proceedings Article | 7 January 2004 Paper

High-power laser-produced plasma source for nanolithography

Richard Forber, Celestino Gaeta, Harry Rieger, Heinz Siegert, Scott McLeod, Brent Boerger

Proceedings Volume 5196, (2004) https://doi.org/10.1117/12.514053

KEYWORDS: X-rays, Extreme ultraviolet, Amplifiers, Lithography, Plasma, Tin, Laser development, Collimation, Collimators, Extreme ultraviolet lithography

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Proceedings Article | 16 June 2003 Paper

High-conversion-efficiency tin material laser-plasma source for EUVL

Chiew-Seng Koay, Christian Keyser, K. Takenoshita, Etsuo Fujiwara, Moza Al-Rabban, Martin Richardson, I. C. Edmond Turcu, Harry Rieger, A. Stone, James Morris

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504572

KEYWORDS: Plasma, Tin, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Mirrors, Sensors, Laser development, Reflectivity, Optical filters

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Proceedings Article | 1 July 2002 Paper

High-power laser-plasma x-ray source for lithography

Celestino Gaeta, Harry Rieger, I. C. Edmond Turcu, Richard Forber, Kelly Cassidy, S. Campeau, Michael Powers, J. Maldonado, James Morris, Richard Foster, Henry Smith, M. Lim

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472353

KEYWORDS: X-rays, X-ray sources, X-ray lithography, Plasma, Semiconducting wafers, Collimators, Photomasks, Lithography, Calibration, Copper

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Proceedings Article | 6 December 2001 Paper

Compact high-power laser-plasma x-ray source for lithography

Celestino Gaeta, Harry Rieger, I. C. Edmond Turcu, Richard Forber, S. Campeau, Kelly Cassidy, Michael Powers, Robert Grygier, Juan Maldonado, G. French, Joe Naunguyan, Charles Kelsy, Peter Hark, James Morris, Richard Foster

Proceedings Volume 4502, (2001) https://doi.org/10.1117/12.449863

KEYWORDS: X-rays, X-ray sources, X-ray lithography, Plasma, Semiconducting wafers, Copper, Lithography, Pulsed laser operation, Laser systems engineering, Calibration

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Proceedings Article | 2 November 2000 Paper

Microfocus soft x-ray source generated by a compact high-power laser plasma

I. C. Edmond Turcu, Harry Rieger, Yuli Vladimirsky, Robert Grygier, Michael Powers, Joe Naunguyan, S. Campeau, G. French, Richard Forber, Richard Foster

Proceedings Volume 4144, (2000) https://doi.org/10.1117/12.405882

KEYWORDS: X-rays, X-ray sources, Plasma, Copper, X-ray lithography, Pulsed laser operation, Laser systems engineering, X-ray lasers, Helium, Picosecond phenomena

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Proceedings Article | 23 November 1999 Paper

High-power x-ray point source for next-generation lithography

I. C. Edmond Turcu, Richard Forber, Robert Grygier, Harry Rieger, Michael Powers, S. Campeau, G. French, Richard Foster, Phillip Mitchell, Celestino Gaeta, Z. Cheng, Jay Burdett, David Gibson, Stephen Lane, Troy Barbee, Stanley Mrowka, Juan Maldonado

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371118

KEYWORDS: X-rays, Collimators, Copper, X-ray lithography, Plasma, Semiconducting wafers, X-ray sources, Helium, Semiconductor lasers, Lithography

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Showing 5 of 8 publications

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