Ms. Jiwon Kang Profile

Jiwon Kang

at Hanyang Univ

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Author

Publications (5)

Proceedings Article | 21 November 2023 Poster + Paper

Comparing the mechanical stability of the pellicle under mask stage acceleration with different defect conditions

Ji-Hyun Jeon, Ji-Won Kang, Hye-Keun Oh

Proceedings Volume 12750, 1275013 (2023) https://doi.org/10.1117/12.2687920

KEYWORDS: Pellicles, Scanners, Extreme ultraviolet, Particles, Finite element methods, Extreme ultraviolet lithography, Yield improvement, Transmittance, Thermal stability, Thermal deformation

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Proceedings Article | 28 April 2023 Presentation + Paper

Effect of particle defect to extreme ultra-violet pellicle

Ji-Hyun Jeon, Ji-Won Kang, Hee-Chang Ko, Won-Young Choi, Hye-Keun Oh

Proceedings Volume 12494, 124940G (2023) https://doi.org/10.1117/12.2657898

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Temperature metrology, Semiconducting wafers, Tin, Aluminum, Scanners, Materials properties, High volume manufacturing

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Proceedings Article | 1 December 2022 Poster + Paper

Estimation of mechanical stability of EUV pellicle by the collision of the particle defect

Ji-Won Kang, Won-Young Choi, Hee-Chang Ko, Jang-Gun Park, Min-Woo Kim, Jun-Hyeung Lee, Hye-Keun Oh

Proceedings Volume 12292, 122920S (2022) https://doi.org/10.1117/12.2643119

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Graphene, Silicon carbide, Transmittance, Extreme ultraviolet lithography, Photomasks, Image processing, Semiconducting wafers

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Proceedings Article | 31 October 2022 Poster

Possible underlayer dependent CD and overlay variation due to different heat absorption with EUV exposure

Wonyoung Choi, Heechang Ko, Jiwon Kang, Janggun Park, Minwoo Kim, Junhyeong Lee, Hyekeun Oh

Proceedings Volume PC12292, PC122920R (2022) https://doi.org/10.1117/12.2643047

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Absorption, Thin films, Semiconducting wafers, Photoresist materials, Overlay metrology, Thin film manufacturing, Thin film deposition, Semiconductors

Proceedings Article | 26 May 2022 Poster + Paper

Optimal thickness of phase shift mask considering phase and reflectance in high NA EUV contact-hole pattern

Jang-Gun Park, Min-Woo Kim, Ji-Won Kang, Hee-Chang Ko, Jun-Hyung Lee, Won-Young Choi, Hye-Keun Oh

Proceedings Volume 12051, 120510O (2022) https://doi.org/10.1117/12.2613984

KEYWORDS: Reflectivity, Nanoimprint lithography, Photomasks, Extreme ultraviolet, Phase shifts, Stochastic processes, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, 3D image processing

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