Mr. Jong Woo Choi Profile

Jong Woo Choi

at Tekscend Photomask Korea Inc

SPIE Involvement:

Author

Publications (2)

Proceedings Article | 6 December 2004 Paper

High flow rate development: process optimization using megasonic immersion development (MID)

Daniel Courboin, Jong Woo Choi, Sang Hyun Jung, Seung Hee Baek, Lee Ju Kim

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569774

KEYWORDS: Etching, Photomasks, Critical dimension metrology, Picture Archiving and Communication System, Photoresist processing, Lithography, Scanning electron microscopy, Standards development, Semiconducting wafers, Process control

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Proceedings Article | 20 August 2004 Paper

Investigations on microloading effect: a parallel approach to PGSD (proximity gap suction development)

Daniel Courboin, Jong Woo Choi, S. Jung, Seung Hee Baek, Lee-Ju Kim, Chang Nam Ahn, Hong-Seok Kim

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557708

KEYWORDS: Critical dimension metrology, Standards development, Photomasks, Lithography, Semiconducting wafers, Diffractive optical elements, Photoresist processing, Acoustics, Temperature metrology, Physics

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