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Jun Xue
at Lam Research Corp
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Publications (1)
Proceedings Article | 30 April 2023 Presentation
Dry resist patterning readiness towards high-NA EUV lithography
Hyo Seon Suh, Danilo De Simone, Christophe Beral, Mihir Gupta, Nadia Vandenbroeck, Anuja De Silva, Ali Haider, Ching-Chung Huang, Mohand Brouri, Francesco Gullo, Shruti Jambaldinni, Benjamin Kam, Hicham Zaid, Elisseos Verveniotis, Samantha Tan, Tim Weidman, Jengyi Yu, Da Li, Jun Xue, Younghee Lee
Proceedings Volume 12498, 1249803 (2023) https://doi.org/10.1117/12.2661652
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist processing, Materials processing, Interfaces
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