Dr. Jun Yashima Profile

Dr. Jun Yashima

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Author

Publications (13)

Proceedings Article | 30 September 2021 Presentation

An SEM-based deep defect classification system for VSB mask writer that works with die-to-die and die-to-database inspection methods using multiple digital twins built with the state-of-the-art neural networks

Ajay Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim DeWitt, Noriaki Nakayamada, Aki Fujimura

Proceedings Volume 11855, 118550D (2021) https://doi.org/10.1117/12.2601004

KEYWORDS: Inspection, Vestigial sideband modulation, Classification systems, Scanning electron microscopy, Neural networks, Reticles, Computer aided design, Solid modeling, Glasses, Defect inspection

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Proceedings Article | 23 August 2021 Paper

A deep learning toolset to mask analysis with SEM digital twins

Ajay Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim Dewitt, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura

Proceedings Volume 11908, 1190805 (2021) https://doi.org/10.1117/12.2601856

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Proceedings Article | 16 October 2020 Presentation + Paper

A deep learning mask analysis toolset using mask SEM digital twins

Ajay Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim Dewitt, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura

Proceedings Volume 11518, 1151814 (2020) https://doi.org/10.1117/12.2576431

KEYWORDS: Scanning electron microscopy, Digital filtering, Image registration, Image filtering, Image classification, Data modeling, Solid modeling, Image quality, Image processing, Image analysis

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Proceedings Article | 25 October 2016 Paper

Electron beam mask writer EBM-9500 for logic 7nm node generation

Hideki Matsui, Takashi Kamikubo, Satoshi Nakahashi, Haruyuki Nomura, Noriaki Nakayamada, Mizuna Suganuma, Yasuo Kato, Jun Yashima, Victor Katsap, Kenichi Saito, Ryoei Kobayashi, Nobuo Miyamoto, Munehiro Ogasawara

Proceedings Volume 9985, 998508 (2016) https://doi.org/10.1117/12.2242987

KEYWORDS: Photomasks, Lithography, Electron beams, Logic, Electron beam melting, Line edge roughness, Electron beam lithography, Extreme ultraviolet, Optical lithography, LCDs

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Proceedings Article | 9 July 2015 Paper

Study on modeling of resist heating effect correction in EB mask writer EBM-9000

Haruyuki Nomura, Takashi Kamikubo, Mizuna Suganuma, Yasuo Kato, Jun Yashima, Noriaki Nakayamada, Hirohito Anze, Munehiro Ogasawara

Proceedings Volume 9658, 96580R (2015) https://doi.org/10.1117/12.2199615

KEYWORDS: Critical dimension metrology, Modulation, Temperature metrology, Computer simulations, Photomasks, Quartz, Thermal modeling, Diffusion, Roentgenium, Electron beam lithography

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Proceedings Article | 17 October 2014 Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito, Hiroyoshi Ando, Hideo Inoue, Noriaki Nakayamada, Takashi Kamikubo, Rieko Nishimura, Yoshinori Kojima, Jun Yashima, Akihito Anpo, Seiichi Nakazawa, Tomohiro Iijima, Kenji Ohtoshi, Hirohito Anze, Victor Katsap, Steven Golladay, Rodney Kendall

Proceedings Volume 9235, 92350X (2014) https://doi.org/10.1117/12.2065551

KEYWORDS: Photomasks, Electron beam melting, Electron beams, Data conversion, Amplifiers, LCDs, Mask making, Seaborgium, Beam shaping

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Proceedings Article | 28 July 2014 Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Proceedings Volume 9256, 925607 (2014) https://doi.org/10.1117/12.2065230

KEYWORDS: Photomasks, Electron beam melting, Amplifiers, Electron beams, Logic, LCDs, Mask making, Objectives, Vestigial sideband modulation

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Proceedings Article | 14 October 2011 Paper

Enhancement of global CD correction and data processing in EB mask writer EBM-8000

Hiroshi Matsumoto, Yasuo Kato, Tomoo Motosugi, Jun Yashima, Takayuki Abe, Noriaki Nakayamada, Shusuke Yoshitake, Kiyoshi Hattori

Proceedings Volume 8166, 816620 (2011) https://doi.org/10.1117/12.898846

KEYWORDS: Forward error correction, Critical dimension metrology, Modulation, Photomasks, Data processing, Data corrections, Software development, Scattering, Data modeling, Electron beam melting

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SPIE Journal Paper | 1 October 2008

High-accuracy correction of critical dimension errors taking sequence of large-scale integrated circuits fabrication processes into account

Takayuki Abe, Jun Yashima, Hayato Shibata, Yasuo Kato, Hiroshi Matsumoto, Tomohiro Iijama

JM3, Vol. 7, Issue 04, 043008, (October 2008) https://doi.org/10.1117/12.10.1117/1.3013546

KEYWORDS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis

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SPIE Journal Paper | 1 April 2008

High-accuracy correction of critical dimension errors appearing in large-scale integration fabrication processes

Takayuki Abe, Jun Yashima, Hayato Shibata

JM3, Vol. 7, Issue 02, 023006, (April 2008) https://doi.org/10.1117/12.10.1117/1.2909474

KEYWORDS: Critical dimension metrology, Computed tomography, Forward error correction, Convolution, Modulation, Fourier transforms, Semiconducting wafers, Erbium, Lithography, Numerical analysis

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Proceedings Article | 30 October 2007 Paper

Correction technique of EBM-6000 prepared for EUV mask writing

Shusuke Yoshitake, Hitoshi Sunaoshi, Jun Yashima, Shuichi Tamamushi, Munehiro Ogasawara

Proceedings Volume 6730, 673030 (2007) https://doi.org/10.1117/12.747748

KEYWORDS: Photomasks, Extreme ultraviolet, Metrology, Extreme ultraviolet lithography, Error analysis, Reflectivity, Semiconducting wafers, EUV optics, Mirrors, Inspection

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Proceedings Article | 14 May 2007 Paper

Study of heating effect on CAR in electron-beam mask writing

Takashi Kamikubo, Makoto Hiramoto, Jun Yashima, Masazumi Takahashi, Rieko Nishimura, Takehiko Katsumata, Hirohito Anze, Hitoshi Sunaoshi, Shuichi Tamamushi, Munehiro Ogasawara

Proceedings Volume 6607, 660723 (2007) https://doi.org/10.1117/12.728986

KEYWORDS: Critical dimension metrology, Electron beams, Photomasks, Temperature metrology, Cadmium, Denoising, Resolution enhancement technologies, Computer simulations, Polymers, Optical lithography

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Proceedings Article | 11 May 2007 Paper

Electron-beam mask writer EBM-6000 for 45-nm HP node

Jun Yashima, Kenji Ohtoshi, Noriaki Nakayamada, Hirohito Anze, Takehiko Katsumata, Tomohiro Iijima, Rieko Nishimura, Syuuichiro Fukutome, Nobuo Miyamoto, Seiji Wake, Yusuke Sakai, Shinji Sakamoto, Shigehiro Hara, Hitoshi Higurashi, Kiyoshi Hattori, Kenichi Saito, Rodney Kendall, Shuichi Tamamushi

Proceedings Volume 6607, 660703 (2007) https://doi.org/10.1117/12.728917

KEYWORDS: Line edge roughness, Photomasks, Control systems, Standards development, Manufacturing, Monochromatic aberrations, Electron beam melting, Photoresist processing, Beam shaping, Electron beams

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Showing 5 of 13 publications

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