Dr. Kateryna Lyakhova Profile

Dr. Kateryna Lyakhova

Sr Project Leader at ASML Netherlands BV

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Publications (5)

Proceedings Article | 27 April 2023 Presentation + Paper

EPE-aware process optimization for scanner dose and overlay in DRAM use case

Inho Kwak, Nanhyung Kim, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh, Antonio Corradi, Yun-A Sung, Thomas Kim, Stefan Smith-Meerman, Stefan van der Sanden, Sung-Min Park, Bob Boo, Hyok-Man Kwon

Proceedings Volume 12496, 124960N (2023) https://doi.org/10.1117/12.2658274

KEYWORDS: Scanners, Overlay metrology, Semiconducting wafers, Lithography, Metrology, Dysprosium, Distributed interactive simulations, Design and modelling, Critical dimension metrology, Yield improvement

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Proceedings Article | 22 February 2021 Presentation + Paper

Extending 0.33 NA EUVL to 28 nm pitch using alternative mask and controlled aberrations

D. Rio, P. Van Adrichem, M. Delorme, K. Lyakhova, C. Spence, J.-H. Franke

Proceedings Volume 11609, 116090T (2021) https://doi.org/10.1117/12.2583800

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Proceedings Article | 26 September 2019 Presentation + Paper

Improving exposure latitudes and aligning best focus through pitch by curing M3D phase effects with controlled aberrations

Joern-Holger Franke, Joost Bekaert, Victor Blanco, Lieve Van Look, Felix Wahlisch, Kateryna Lyakhova, Paul van Adrichem, Mark Maslow, Guido Schiffelers, Eric Hendrickx

Proceedings Volume 11147, 111470E (2019) https://doi.org/10.1117/12.2537104

KEYWORDS: Diffraction, Extreme ultraviolet lithography, Metals, Photomasks, Semiconducting wafers, Nanoimprint lithography, Optical proximity correction, Extreme ultraviolet, Phase modulation, Phase shift keying

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Proceedings Article | 3 October 2018 Presentation + Paper

EUV pupil optimization for 32nm pitch logic structures

D. Rio, V. Blanco, J.-H. Franke, W. Gillijns, M. Dusa, E. De Poortere, P. Van Adrichem, K. Lyakhova, C. Spence, E. Hendrickx, S. Biesemans, K. Nafus

Proceedings Volume 10809, 108090N (2018) https://doi.org/10.1117/12.2503321

KEYWORDS: Source mask optimization, Semiconducting wafers, Scanners, Logic, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet

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Proceedings Article | 18 March 2016 Paper

Assist features: placement, impact, and relevance for EUV imaging

Iacopo Mochi, Vicky Philipsen, Emily Gallagher, Eric Hendrickx, Kateryna Lyakhova, Friso Wittebrood, Guido Schiffelers, Timon Fliervoet, Shibing Wang, Stephen Hsu, Vince Plachecki, Stan Baron, Bart Laenens

Proceedings Volume 9776, 97761S (2016) https://doi.org/10.1117/12.2220025

KEYWORDS: Neodymium, Photomasks, Semiconducting wafers, Extreme ultraviolet, Image processing, Lithography, Lithographic illumination, Extreme ultraviolet lithography, Optical proximity correction, Atrial fibrillation, Reticles, Printing, Deep ultraviolet

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