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Maria Melanson
at DuPont Electronics & Industrial
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Publications (1)
Proceedings Article | 10 April 2024 Poster
Formulation and filtration strategies to reduce etch related defectivity of advanced chemically amplified EUV resist
Suzanne Coley, Jong Keun Park, Emad Aqad, Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu, Rochelle Rena, Jason Behnke, Karen Petrillo
Proceedings Volume 12957, 129571Y (2024) https://doi.org/10.1117/12.3010919
KEYWORDS: Extreme ultraviolet, Stochastic processes, Etching, Photoresist processing, Photons, Manufacturing, Lithography, Design and modelling, Optical lithography, Materials processing
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