Ms. Rochelle Rena Profile

Rochelle Rena

at DuPont Electronics & Industrial

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 10 April 2024 Presentation + Paper

Advanced EUV CAR small molecule compounds design and its impact to etch performance

Yinjie Cen, Jong Keun Park, Suzanne Coley, Benjamin Naab-Rafael, Li Cui, Emad Aqad, Stefan Alexandrescu, Rochelle Rena, Sylvie Eckert, Jason Behnke, ChoongBong Lee, Karen Petrillo

Proceedings Volume 12957, 129570A (2024) https://doi.org/10.1117/12.3010931

KEYWORDS: Etching, Photoresist materials, Extreme ultraviolet lithography

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Proceedings Article | 10 April 2024 Poster

Formulation and filtration strategies to reduce etch related defectivity of advanced chemically amplified EUV resist

Suzanne Coley, Jong Keun Park, Emad Aqad, Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu, Rochelle Rena, Jason Behnke, Karen Petrillo

Proceedings Volume 12957, 129571Y (2024) https://doi.org/10.1117/12.3010919

KEYWORDS: Extreme ultraviolet, Stochastic processes, Etching, Photoresist processing, Photons, Manufacturing, Lithography, Design and modelling, Optical lithography, Materials processing

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Proceedings Article | 9 April 2024 Paper

Impact of increasing EUV absorption of CAR polymers on lithographic performance

Yinjie Cen, Emad Aqad, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Rochelle Rena, Tyler Paul, Sylvie Eckert, Chunyi Wu, Mike Finch, Jason Behnke, ChoongBong Lee, Karen Petrillo

Proceedings Volume 12957, 129571Z (2024) https://doi.org/10.1117/12.3010961

KEYWORDS: Polymers, Extreme ultraviolet, Absorption, Extreme ultraviolet lithography, Photoresist materials, Line width roughness, Lithography

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Proceedings Article | 9 April 2024 Poster + Paper

Identifying trends in photoresist polymer properties to improve line and space defects

Benjamin Rafael-Naab, Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Choong Bong Lee, Jason Behnke, Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu, K. A. Niradha Sachinthani, Michael Finch, Karen Petrillo, Li Cheng

Proceedings Volume 12957, 129571S (2024) https://doi.org/10.1117/12.3010493

KEYWORDS: Defect inspection, Photoresist materials, Polymers, Line width roughness, Extreme ultraviolet lithography, Photoacid generators, Semiconducting wafers

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Proceedings Article | 1 May 2023 Presentation + Paper

Understanding etch properties of advanced chemically amplified EUV resist

Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Benjamin Naab, Choongbong Lee, Rochelle Rena, Philjae Kang, You Rim Shin, David Limberg, Lei Zhang

Proceedings Volume 12499, 124990I (2023) https://doi.org/10.1117/12.2659178

KEYWORDS: Etching, Iodine, Extreme ultraviolet, Plasma, Plasma etching, X-ray photoelectron spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Light absorption, Absorption

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Proceedings Article | 1 May 2023 Poster + Paper

Spin speed impact on photoresist thin film properties and EUV lithographic performance

Yinjie Cen, ChoongBong Lee, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Emad Aqad, Rochelle Rena, Tyler Paul, Tom Penniman, Jason Behnke, Julia Early, Benjamin Foltz

Proceedings Volume 12498, 124981W (2023) https://doi.org/10.1117/12.2659101

KEYWORDS: Photoresist materials, Film thickness, Lithography, Extreme ultraviolet lithography, Line width roughness, Thin films, Surface roughness

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Proceedings Article | 1 May 2023 Poster + Paper

Considerations in the design of photoacid generators

Conner Hoelzel, Li Cui, Benjamin Naab, Jong Park, Philjae Kang, Kenneth Hernandez, Suzanne Coley, Stefan Alexandrescu, Rochelle Rena, James Cameron, Emad Aqad

Proceedings Volume 12498, 124981V (2023) https://doi.org/10.1117/12.2658981

KEYWORDS: Photoacid generators, Extreme ultraviolet lithography, Electrons, Extreme ultraviolet, Polymers, Design and modelling, Lithography, Materials properties, Line width roughness, Semiconducting wafers

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Proceedings Article | 24 March 2020 Presentation

Line width roughness reduction strategies utilizing power spectral density analysis (Conference Presentation)

Charlotte Cutler, Dan Millward, Choong-Bong Lee, James Thackeray, John Nelson, Jason DeSisto, Rochelle Rena, Chris Mack

Proceedings Volume 11326, 113260H (2020) https://doi.org/10.1117/12.2551694

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Proceedings Article | 25 March 2019 Presentation + Paper

Roughness power spectral density as a function of aerial image and basic process/resist parameter

Charlotte Cutler, Choong Bong Lee, James Thackeray, John Nelson, Jason DeSisto, Rochelle Rena, Peter Trefonas, Chris Mack

Proceedings Volume 10960, 109600I (2019) https://doi.org/10.1117/12.2515073

KEYWORDS: Line width roughness, Nanoimprint lithography, Diffusion, Diffractive optical elements, Image processing, Photoresist processing, Temperature metrology, Image analysis, Image resolution, Lithography

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Proceedings Article | 23 March 2018 Presentation + Paper

Roughness power spectral density as a function of resist parameters and its impact through process

Charlotte Cutler, James Thackeray, Jason DeSisto, John Nelson, Choong-Bong Lee, Mingqi Li, Emad Aqad, Xisen Hou, Tomas Marangoni, Joshua Kaitz, Rochelle Rena, Chris Mack

Proceedings Volume 10587, 1058707 (2018) https://doi.org/10.1117/12.2297690

KEYWORDS: Line width roughness, Scanning electron microscopy

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Showing 5 of 10 publications

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