Chemically amplified resists (CAR) enable the transition of extreme ultraviolet (EUV) lithography to high-volume manufacture (HVM). Novel photoresists continue to be designed to meet the simultaneous improvement of resolution, line width roughness, and sensitivity (RLS) trade-off. The absorption of EUV photons in the photoresist film leads to emission of primary electrons to form secondary electrons by inelastic scattering events which in turn leads to the activation of the photoacid generator compound. A unique challenge for the use of CAR in EUV lithography is their poor absorption at 13.5nm wavelength. Understanding the photoresist EUV absorption impact on lithographic performance parameters is critical for photoresist design. In this study, we designed photoresist polymers with tuned EUV absorption coefficients by incorporating EUV absorption group(s) onto different CAR polymers. The effect of the EUV absorption increase on polymer properties as well as on resist lithographic performance will be presented.
Chemically amplified resist (CAR) materials are widely used in advanced node patterning by extreme ultraviolet lithography (EUVL). To support the continuous requirement of reducing critical dimension (CD), CAR has been designed to process at tens of nanometer coating thickness while taking into consideration film roughness, aspect ratio, and etch transfer challenge. In this study, we investigated the impact of the photoresist’s different spin speed for same film thickness on resolution, line width roughness, and sensitivity (RLS) trade-off for Line and Space (L/S) patterns. We selected photoresists with identical chemical composition that differed only in total wt solid% in the solution. Photoresist films at constant thickness were investigated for the spin speed impacts on photoresist film density, hydrophobicity on the film surface, and film surface roughness. The corresponding EUV lithographic performance will be presented.
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