Dr. Mingyu Kim Profile

Dr. Mingyu Kim

at KLA MACH

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 10 April 2024 Presentation + Paper

Device overlay root cause process detection using patterned wafer geometry information

Sejung Ham, Youngkwang Song, Cheolwoo Lee, Mingyu Kim, Minsung Hyun, Sunghyun Park, Moonsoup Kim, Jeonghoon Lee, Nanglyeom Oh, Sunglyul Park, Dongsub Choi

Proceedings Volume 12955, 129551D (2024) https://doi.org/10.1117/12.3008290

KEYWORDS: Semiconducting wafers, Overlay metrology, Optical alignment, Vacuum chambers, Lithography, Scanners, Optical parametric oscillators, Process control, Error analysis, 3D metrology

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Proceedings Article | 10 April 2024 Poster + Paper

Single-cell measurements by parallax effect for process control and target size reduction

Changkyu Lee, Sumin Jang, Baikkyu Hong, Ikhyun Jeong, Sunouk Nam, Hyunsok Kim, Jaewuk Ju, Minho Jung, Mingyu Kim, Hongpeng Su, Yanan Wang, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Roie Volkovich, Nadav Gutman, Ohad Bachar, Renan Milo

Proceedings Volume 12955, 129552H (2024) https://doi.org/10.1117/12.3010101

KEYWORDS: Overlay metrology, Semiconducting wafers, Wafer level optics, Metrology, Optical gratings, Process control, Optical parametric oscillators, Time metrology, Optical alignment

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Proceedings Article | 27 April 2023 Poster + Paper

ADI to in-cell overlay stability improvement for DRAM using novel scatterometry and comprehensive process control

Hyunsok Kim, Jaewuk Ju, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Changkyu Lee, Kangmin Lee, Sumin Jang, Jaeyoun Lee, Hongcheon Yang, Minho Jeong, Mingyu Kim, Hongpeng Su, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Renan Milo, Rawi Dirawi

Proceedings Volume 12496, 124962E (2023) https://doi.org/10.1117/12.2657632

KEYWORDS: Overlay metrology, Semiconducting wafers, Advanced process control, Scanners, Scatterometry, Process control, Signal processing, Metrology, Control systems, Optical parametric oscillators

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Proceedings Article | 27 April 2023 Presentation + Paper

Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination

Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Rawi Dirawi

Proceedings Volume 12496, 1249620 (2023) https://doi.org/10.1117/12.2657678

KEYWORDS: Overlay metrology, Light sources and illumination, Metrology, Signal detection, Scatterometry, Diffraction, Semiconducting wafers, Etching, Tunable lasers, Signal processing

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Proceedings Article | 26 May 2022 Poster + Presentation + Paper

Advanced CD uniformity correction using radial basis function (RBF) models

Philip Groeger, Ulrich Denker, Robin Zech, Stefan Buhl, Matthias Ruhm, Mingyu Kim, Hongseok Jang, Chunsoo Kang, Dongyoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee, Dongsub Choi, Jeonghoon Lee

Proceedings Volume 12053, 1205314 (2022) https://doi.org/10.1117/12.2607571

KEYWORDS: Semiconducting wafers, Data modeling, Scanners, Critical dimension metrology, Performance modeling, Mathematical modeling, Etching, Error analysis, Algorithm development, Zernike polynomials, Modeling, Modeling and simulation

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Proceedings Article | 26 March 2019 Paper

CD and OCD sampling scheme optimization for HVM environment

Chanha Park, Hongoo Lee, Dongyoung Lee, Ahlin Choi, Stefan Buhl, Wan-Soo Kim, Philip Groeger, Steffen Guhlemann, Seop Kim, Mingyu Kim

Proceedings Volume 10959, 109592F (2019) https://doi.org/10.1117/12.2514975

KEYWORDS: Metrology, Data modeling, Statistical modeling, Critical dimension metrology, Data corrections

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Showing 5 of 6 publications

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