Dr. Stephan Waldner Profile

Dr. Stephan Waldner

Senior Scientist at Evatec AG

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Author

Publications (9)

Proceedings Article | 18 December 2024 Poster + Paper

Design, manufacturing, and characterization of multilayer mirrors based on magnetron sputtered quantized nanolaminates

Stephan Waldner, Manuel Baertschi, Silvia Schwyn Thoeny, Fabian Steger, Daniel Schachtler, Christoph Sturzenegger, Xavier Maeder

Proceedings Volume 13190, 131900O (2024) https://doi.org/10.1117/12.3048316

KEYWORDS: Design, Laser damage threshold, Mirrors, Tantalum, Femtosecond phenomena, Electric fields, Magnetrons, Refractive index, Manufacturing, Sputter deposition

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Proceedings Article | 18 December 2024 Presentation + Paper

Process development of Ta2O5-SiO2 quantized nanolaminates for the use of complex optical filter systems

Manuel Baertschi, Stephan Waldner, Fabian Steger, Thomas Frei, Silvia Schwyn Thoeny, Xavier Maeder, Daniel Schachtler, Christoph Sturzenegger

Proceedings Volume 13190, 1319006 (2024) https://doi.org/10.1117/12.3032939

KEYWORDS: Refractive index, Tantalum, Coating, Mirrors, Laser damage threshold, Electric fields, Thin film coatings, Magnetrons, Coating thickness, Absorption

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Proceedings Article | 24 June 2024 Presentation + Paper

Quantized nanolaminates: investigation of a novel type of meta materials deposited by magnetron sputtering

S. Schwyn Thöny, M. Bärtschi, M. Batzer, M. Baselgia, R. Gmünder, A. Sharma, T. Vermeij, X. Maeder, S. Waldner

Proceedings Volume 13020, 1302007 (2024) https://doi.org/10.1117/12.3016637

KEYWORDS: Refractive index, Tantalum, Absorption, Magnetrons, Coating thickness, Sputter deposition, Design, Quantization, Optical coatings, Antireflective coatings

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Proceedings Article | 24 November 2023 Presentation

Quantized nanolaminates of Ta2O5-SiO2 and amorphous silicon-SiO2 manufactured by magnetron sputter deposition

Silvia Schwyn Thoeny, Manuel Bärtschi, Marietta Batzer, Manuel Baselgia, Raphael Gmünder, Stephan Waldner

Proceedings Volume PC12726, PC127260N (2023) https://doi.org/10.1117/12.2682100

KEYWORDS: Sputter deposition, Silica, Tunable filters, Silicon, Refractive index, Manufacturing, Magnetrons, Absorption, Optics manufacturing, Optical coatings

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Proceedings Article | 28 September 2021 Presentation + Paper

Pre-production simulation of optical monitoring combining monochromatic and broadband monitoring strategies

Silvia Schwyn Thoeny, Daniel Schachtler, Stephan Waldner, Thomas Frei, Manuel Baertschi

Proceedings Volume 11872, 118720O (2021) https://doi.org/10.1117/12.2597085

KEYWORDS: Coating, Error analysis, Camera shutters, Optical simulations, Neodymium, Global system for mobile communications, Data processing, Tolerancing, Signal processing, Reflectivity

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Various types of optical monitoring systems are established in industry. They range from single wavelength, over monochromatic to broadband monitoring to calculate a monitoring signal, which allows to terminate each layer in a filter at the required thickness. State of the art monitoring systems offer the capability of monochromatic and broadband monitoring in a single device. With these technologies available, the question arises how to combine these monitoring strategies for a specific application in a way, which leads to accurate coating results with the least sensitivity to production errors and thus to the highest yield. To answer this question without the need to perform costly coating runs, we developed a software tool, which mimics all the monitoring features of Evatec’s GSM optical monitoring system. Additionally, the software is able to disturb the simulated ideal monitoring signal with errors such as detector noise, drifts, deviations in shutter delay times, etc. The values of these disturbances are specific to the deposition tool. They were determined based on the broadband spectra of actual coating runs. By starting a virtual coating run with defined disturbances, the thickness deviations expected with a selected strategy can be assessed and the development of thickness deviations during the run, i.e. error compensation and error accumulation can be simulated. Within the software, parameters for the termination of each layer can be varied individually and the effect on the coating result can be observed. In order to demonstrate the capability of this tool, a specific coating design was then selected. For this design various monitoring strategies were tested, broadband strategies with different wavelength ranges, monochromatic strategies varying wavelength assignment per layer but also mixed strategies of broadband and monochromatic monitoring. The most stable monitoring strategy resulting from these simulations was coated as well as some of the less promising candidates and their results were compared.

Proceedings Article | 4 October 2011 Paper

Optimization of ion-assisted ITO films by design of experiment

Silvia Schwyn Thöny, Jürgen Buchholz, Stephan Waldner

Proceedings Volume 8168, 81681H (2011) https://doi.org/10.1117/12.896398

KEYWORDS: Transmittance, Resistance, Diffractive optical elements, Oxygen, Refractive index, Plasma, Surface roughness, Absorption, Reflectivity, Thin films

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Proceedings Article | 17 August 1999 Paper

Compact shearography system for the measurement of 3D deformation

Stephan Waldner, Stefan Brem

Proceedings Volume 3745, (1999) https://doi.org/10.1117/12.357771

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Proceedings Article | 17 September 1997 Paper

Modified electronic speckle pattern shearing interferometry for simultaneous derivative map measurements

Grzegorz Dymny, Malgorzata Kujawinska, Stephan Waldner

Proceedings Volume 3098, (1997) https://doi.org/10.1117/12.281162

KEYWORDS: Speckle pattern, Interferometry, Image processing, Polarization, Optoelectronics, Mirrors, Finite element methods, Signal processing, Beam splitters, Aluminum

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Proceedings Article | 15 November 1996 Paper

Removing the image-doubling in shearography: theory and application

Stephan Waldner

Proceedings Volume 2944, (1996) https://doi.org/10.1117/12.259065

KEYWORDS: Shearography, Fringe analysis, Mirrors, Nondestructive evaluation, Phase measurement, Image processing, Phase shifts, Speckle pattern, Interferometry, Foam

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Showing 5 of 9 publications

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