Mr. Terumasa Kosaka Profile

Terumasa Kosaka

R & D Engineer

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Author

Publications (4)

Proceedings Article | 25 March 2019 Paper

Influence of PDI and composition ratio for micro phase separation about PS-b-PMMA block copolymer

Terumasa Kosaka, Ryota Matsuki, Yukio Kawaguchi, Ryosuke Ogaki

Proceedings Volume 10960, 109601I (2019) https://doi.org/10.1117/12.2514961

KEYWORDS: Polymerization, Picosecond phenomena, Polymers, Polymethylmethacrylate, Scanning electron microscopy, Directed self assembly, Semiconductors, Lithography, Metals

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Proceedings Article | 19 March 2018 Presentation

Defect dynamics in directed self-assembly of block copolymers (Conference Presentation)

Tsukasa Azuma, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsuyoshi Kodera, Ken Miyagi, Masayuki Shiraishi, Ryota Matsuki, Terumasa Kosaka, Toshiyuki Himi, Seiji Nagahara, Alvin Chandra, Ryuichi Nakatani, Teruaki Hayakawa, Kenji Yoshimoto, Takuya Omosu, Mikihito Takenaka

Proceedings Volume 10586, 105860S (2018) https://doi.org/10.1117/12.2297310

KEYWORDS: Directed self assembly, Image processing, Signal processing, Electron beam lithography, Lithography, Annealing, Thin films, Epitaxy, Data modeling, 3D modeling

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Proceedings Article | 27 March 2017 Paper

Development of mass production technology for block copolymer lithographic materials

Toshiyuki Himi, Ryota Matsuki, Terumasa Kosaka, Ryosuke Ogaki, Yukio Kawaguchi, Tetsuo Shimizu

Proceedings Volume 10146, 101461Z (2017) https://doi.org/10.1117/12.2258167

KEYWORDS: Directed self assembly, Polymerization, Lithography, Polymers, High volume manufacturing, Optical lithography, Semiconductors, Molecular self-assembly, Neodymium, Polymethylmethacrylate

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Proceedings Article | 21 March 2016 Paper

Formation of microphase-separated structure with half pitch less than 5.0nm formed by multiblock copolymers for nanolithographic application

T. Kosaka, Y. Kawaguchi, T. Himi, T. Shimizu, K. Hirahara, A. Takano, Y. Matsushita

Proceedings Volume 9779, 977916 (2016) https://doi.org/10.1117/12.2219125

KEYWORDS: Directed self assembly, Lithography, Polymerization, Transmission electron microscopy, Polymers, Nanolithography, Optical lithography, Materials processing, Silicon, X-rays, Light scattering, Scatter measurement

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