Xijun Guan
at Shanghai Huali Integrated Circuit Corp.
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530D (2022) https://doi.org/10.1117/12.2614221
KEYWORDS: Overlay metrology, Double patterning technology, Edge roughness, Scanning electron microscopy, Manufacturing, Line width roughness, Line edge roughness, Integrated circuits, Electron microscopy, Critical dimension metrology

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proceedings Volume 11611, 116112I (2021) https://doi.org/10.1117/12.2583545

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