Gas flow distribution of reaction chamber of reactive ion etching (RIE) etcher is usually considered to be a main factor in determining both the plasma distribution and etching uniformity. Based on the continuum fluid and heat transfer models of the commercial software, Fluent(Ansys), the gas flow distribution of the reaction chamber was simulated. And then the spatial distribution profiles of the pressures above the electrode surface under the different mass flow (50~250sccm) inlet conditions , and the influence of the different GAP (L = 0.03~0.06m) of the chambers on the gas flow uniformity were discussed. The result shows that the pressure distribution above the electrode has the character which the pressure is higher in the center of the electrode and lower at the edge and increases with the rise of the mass flow of inlet. And the uniformity of the gas flow distribution is enhanced with the rise of the GAP of the chamber.
The high-precision fabrication of micro-/nano-structure is a challenge. In this paper, we proposed a new fabrication method of high-precision structure based on an etching resistance layer. The high-precision features were fabricated by photolithography technique, followed by the etching process to transfer the features to the substrate. During this process, the etching uniformity and error lead to the feature distortion. We introduced an etching resistance layer between feature layer and substrate. The etching process will stop when arriving at the resistance layer. Due to the high precision of the plating film, the high-precision structure depth was achieved. In our experiment, we introduced aluminum trioxide as the etching resistance layer. The structures with low depth error of less than 5% were fabricated.
According to the exposure pattern distortion in contact printing caused by the photoresist and sometimes has a rough surface with impurity particles on it, we propose a new flexible hybrid mask for contact printing. The mask consists of three layers: a flexible polymer buffer layer, a polymer structure layer of high Young's modulus, and a metal masking layer. Because the hybrid mask skillfully combines the characteristics of flexible polymer and high Young's modulus polymer, it has two advantages: high flexibility and high resolution. The flexible hybrid mask can attach closely with the photoresist under the condition of vacuum adsorption. So the fabrication of micro-nano structures with high precision and high resolution can be realized. In this paper, a new flexible hybrid mask with critical dimension of 2um was fabricated. The photoresist structure with high precision was manufactured using this mask by photolithography and it verified the feasibility of the mask for lithography.
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