Prof. Jae W. Hahn Profile

Prof. Jae W. Hahn

Professor at Yonsei Univ

SPIE Involvement:

Author

Publications (29)

Proceedings Article | 5 October 2023 Poster

Large area optically transparent frequency selective surface absorber for dual band millimeter-wave / IR stealth

JinA Lee, Kiwook Han, HyeonBo Shim, JaeWon Hahn

Proceedings Volume PC12653, PC126530K (2023) https://doi.org/10.1117/12.2682786

KEYWORDS: Transmittance, FSS based metamaterials, Wet etching, Visible radiation, Transparency, Extremely high frequency, Emissivity, Design and modelling, Adhesives, Visibility

Read Abstract +

Proceedings Article | 20 August 2020 Presentation

Pattern quality analysis in a digital lithography system using scanning point array method

Changmin Lee, Yunhyeok Ko, Jae Hahn

Proceedings Volume 11484, 114840J (2020) https://doi.org/10.1117/12.2567399

KEYWORDS: Lithography, Electron beam lithography, Photomasks, Digital micromirror devices, Optical lithography, Semiconducting wafers, Zone plates, Mirrors

Read Abstract +

Proceedings Article | 19 August 2020 Presentation

Characterization of position and two-dimensional profiles of high-density beam spot array for digital lithography system

Yunhyeok Ko, Changmin Lee, Jae Hahn

Proceedings Volume 11509, 115090H (2020) https://doi.org/10.1117/12.2567574

KEYWORDS: Lithography, Digital micromirror devices, Inspection, Charge-coupled devices, Optical lithography, Photomasks, Beam shaping, Optical testing, Optical filtering, Lenses

Read Abstract +

Proceedings Article | 4 March 2019 Presentation

Analytical model for designing a high-energy-efficiency granular double-layer X-ray scintillator with a diffuse reflection layer (Conference Presentation)

Jookwon Song, Hyeon Bo Shim, Jae Hahn

Proceedings Volume 10870, 108700O (2019) https://doi.org/10.1117/12.2508247

KEYWORDS: Scintillators, X-rays, Analytical research, Energy efficiency, Particles, Monte Carlo methods, Diagnostics, X-ray imaging, Performance modeling, Spatial resolution

Read Abstract +

SPIE Journal Paper | 15 November 2017

Pixel-based learning method for an optimized photomask in optical lithography

Moongyu Jeong, Jae Hahn

JM3, Vol. 16, Issue 04, 043504, (November 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.043504

KEYWORDS: Photomasks, Optical lithography, Source mask optimization, SRAF, Detection and tracking algorithms, Photovoltaics, Semiconducting wafers, Optical proximity correction, Computer simulations, Model-based design

Read Abstract +

Proceedings Article | 25 September 2017 Presentation

Optimized modeling of powder-based x-ray scintillator screen for improved total efficiency by double-layer scintillator design (Conference Presentation)

Jookwon Song, Hyeon Bo Shim, Jae Hahn

Proceedings Volume 10393, 103930N (2017) https://doi.org/10.1117/12.2273566

KEYWORDS: Scintillators, X-rays, Energy efficiency, Visible radiation, Absorption, Image resolution, Image quality, Particles, Fabrication, Manufacturing

Read Abstract +

Proceedings Article | 19 September 2017 Presentation

Spectrum modeling of mid-infrared flare considering realistic measurement environment (Conference Presentation)

Kiwook Han, Wondong Lee, Jae Hahn

Proceedings Volume 10403, 104030N (2017) https://doi.org/10.1117/12.2273542

KEYWORDS: Infrared radiation, Infrared spectroscopy, Environmental sensing, Molecular spectroscopy, Databases, Thermodynamics, Data modeling, Mid-IR, Emission spectroscopy, Transmittance

Read Abstract +

Proceedings Article | 12 December 2016 Presentation

An infrared metamaterial selective absorber with emitter considering atmospheric absorption for low observability (Conference Presentation)

Jagyeong Kim, Kiwook Han, Jae Hahn

Proceedings Volume 9973, 997309 (2016) https://doi.org/10.1117/12.2236828

KEYWORDS: Absorption, Infrared radiation, Structural design, Metamaterials, Infrared detectors, Missiles, Atmospheric modeling, Electromagnetic radiation, Atmospheric sensing, Atmospheric laser remote sensing

Read Abstract +

Proceedings Article | 17 November 2016 Paper

Improvement of photomask CD uniformity using spatially resolved optical emission spectroscopy

Junhwa Jung, Youngkeun Kim, Il-Yong Jang, Byung-Gook Kim, Chan-Uk Jeon, Minwook Kang, Changmin Lee, Jae Hahn

Proceedings Volume 9985, 99851S (2016) https://doi.org/10.1117/12.2242406

KEYWORDS: Photomasks, Etching, Plasma, Chromium, Argon, Dry etching, Chlorine, Emission spectroscopy, Critical dimension metrology, Plasma etching

Read Abstract +

Proceedings Article | 3 November 2016 Presentation

Minimum energy of silver and copper nanoparticles for laser sintering (Conference Presentation)

Changmin Lee, Jae Hahn

Proceedings Volume 9927, 99270S (2016) https://doi.org/10.1117/12.2236804

KEYWORDS: Laser sintering, Silver, Copper, Particles, Nanoparticles, Optical lithography, Analytical research, Electronics, Metals, Manufacturing

Read Abstract +

SPIE Journal Paper | 17 March 2016

Prediction of biases for optical proximity correction through partial coherent identification

Moongyu Jeong, Jae Hahn

JM3, Vol. 15, Issue 01, 013509, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.1.013509

KEYWORDS: Optical proximity correction, Bismuth, Lawrencium, Image segmentation, Model-based design, Detection and tracking algorithms, Neural networks, Optical lithography, Solids, Evolutionary algorithms

Read Abstract +

Proceedings Article | 9 January 2015 Paper

Development of optical inspection system for detecting malfunctions of digital micromirror device

Minwook Kang, Dong Won Kang, Wondong Lee, Jae Hahn

Proceedings Volume 9444, 944417 (2015) https://doi.org/10.1117/12.2075175

KEYWORDS: Digital micromirror devices, Image segmentation, Optical inspection, Micromirrors, Photomasks, Inspection, Mirrors, Optical lithography, Charge-coupled devices, Maskless lithography

Read Abstract +

Proceedings Article | 9 January 2015 Paper

A mid-IR optical emission spectrometer with a PbSe array detector for analyzing spectral characteristic of IR flares

Wondong Lee, Minwook Kang, Jae Hahn

Proceedings Volume 9444, 944415 (2015) https://doi.org/10.1117/12.2075143

KEYWORDS: Spectroscopy, Infrared spectroscopy, Mid-IR, Sensors, Infrared signatures, Detector arrays, Black bodies, Diffraction gratings, Infrared countermeasures, Infrared sensors

Read Abstract +

SPIE Journal Paper | 18 December 2014

Analysis of line-edge roughness due to the stick/slip motion of a contact-mode scanning probe in plasmonic lithography

Changhoon Park, Jinhee Jang, Jae Hahn

JM3, Vol. 13, Issue 04, 043020, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043020

KEYWORDS: Motion analysis, Lithography, Plasmonics, Motion models, Line edge roughness, Molecules, Optical lithography, Molecular interactions, Near field scanning optical microscopy, Capillaries

Read Abstract +

SPIE Journal Paper | 25 August 2014

Thickness measurements of metal thin films with a plasmonic near-field scanning nanoscope using a resonant ridge aperture

Taekyong Lee, Seonghyeon Oh, Jae Hahn

JNP, Vol. 8, Issue 01, 083075, (August 2014) https://doi.org/10.1117/12.10.1117/1.JNP.8.083075

KEYWORDS: Metals, Thin films, Gold, Plasmonics, Near field, Near field scanning optical microscopy, Quartz, Atomic force microscopy, Near field optics, Aluminum

Read Abstract +

SPIE Journal Paper | 1 June 2012

Experimental analysis of pattern line width in digital maskless lithography

Hoonchul Ryoo, Dong Won Kang, Jae Hahn, Yo-Tak Song

JM3, Vol. 11, Issue 02, 023004, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.023004

KEYWORDS: Photoresist materials, Maskless lithography, Digital micromirror devices, Laser sources, Optical simulations, Optical lithography, Digital imaging, Lithography, Computer aided design, Photomasks

Read Abstract +

Proceedings Article | 18 May 2012 Paper

Time-resolved absolute spectral analysis of IR countermeasure flares and its experimental validation by using an optical emission spectrometer with PbSe array detector

Hyungwoo Lee, Changhoon Oh, Jae Hahn

Proceedings Volume 8374, 837408 (2012) https://doi.org/10.1117/12.918837

KEYWORDS: Infrared signatures, Calibration, Infrared countermeasures, Spectroscopy, Black bodies, Mid-IR, Infrared spectroscopy, Sensors, Infrared sensors, Detector arrays

Read Abstract +

Proceedings Article | 21 March 2012 Paper

High-resolution laser direct writing with a plasmonic contact probe

Howon Jung, Yongwoo Kim, Seok Kim, Jinhee Jang, Jae Hahn

Proceedings Volume 8323, 83232A (2012) https://doi.org/10.1117/12.916359

KEYWORDS: Metals, Near field optics, Near field, Optical lithography, Plasmonics, Laser development, Nanolithography, Diffraction, Raster graphics, Near field scanning optical microscopy

Read Abstract +

Proceedings Article | 21 March 2012 Paper

Plasmonic lithography modeling and measurement of near-field distribution of plasmonic nano-aperture

Yongwoo Kim, Seok Kim, Howon Jung, Jinhee Jang, Jae Yong Lee, Jae Hahn

Proceedings Volume 8323, 832320 (2012) https://doi.org/10.1117/12.916237

KEYWORDS: Nondestructive evaluation, Photoresist materials, Near field, Lithography, Plasmonics, Process modeling, Finite-difference time-domain method, Photoresist developing, Near field scanning optical microscopy, 3D modeling

Read Abstract +

In plasmonic nano lithography, a photoresist responds to the localized electric field which decays evanescently in the direction of depth. A simple analytic model is suggested to predict profiles of exposed and finally developed pattern with a finite contrast of photoresist. In this model, the developing process is revisited by accounting the variation of dissolution rate with respect to expose dose distribution. We introduce the concept of nominal developing thickness (NDT) to determine the optimized developing process fitting to the isointensity profile. Based on this model, we obtained three dimensional distribution of near-field of bowtie shaped plasmonic nano aperture in a metal film from the near-field lithography pattern profile. For the near-field exposure, we fabricated a nano aperture in a aluminum metal film which is coated on the contact probe tip. By illuminating 405 nm diode laser source, the positive type photoresist is exposed by the localized electric field produced by nano aperture. The exposed photoresist is developed by the TMAH based solution with a optimum NDT, which leads the developing march encounters the isoexposure contour at threshold dose. From the measurement of developed pattern profile with a atomic force microscope (AFM), the three-dimensional isoexposure (or iso-intensity) surface at the very near region from the exit plane of an aperture (depth: 5 ~ 50 nm) is profiled. Using the threshold dose of photoresist and exposure time, the absolute intensity level is also measured. The experimental results are quantitatively compared with the calculation of FDTD (finite- difference time-domain) method. Concerning with the error in exposure time and threshold dose value, the error in measurement of profile and intensity are less than 6% and 1%, respectively. We expect the lithography model described in this presentation allows more elaborated expectation of developed pattern profile. Furthermore, a methodology of mapping is useful for the quantitative analysis of near-field distribution of nano-scale optical devices.

Proceedings Article | 21 March 2012 Paper

Design of a high positioning contact probe for plasmonic lithography

Jinhee Jang, Yongwoo Kim, Seok Kim, Howon Jung, Jae Hahn

Proceedings Volume 8323, 832322 (2012) https://doi.org/10.1117/12.916274

KEYWORDS: Lithography, Plasmonics, Finite element methods, Near field scanning optical microscopy, Mechanics, Silicon, Nanolithography, Scanning probe lithography, Microfabrication, Optical lithography

Read Abstract +

Proceedings Article | 3 April 2010 Paper

High throughput plasmonic lithography for sub 50nm patterning with a contact probe

Yongwoo Kim, Seok Kim, Howon Jung, Jae Hahn

Proceedings Volume 7637, 76371F (2010) https://doi.org/10.1117/12.848329

KEYWORDS: Optical lithography, Lithography, Metals, Silica, Photoresist materials, Plasmonics, Aluminum, Near field, Glasses, Line width roughness

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Calculation of three-dimensional profiles of photoresist exposed by localized electric fields of high-transmission metal nano-apertures

Eungman Lee, Jae Won Hahn

Proceedings Volume 7140, 71401J (2008) https://doi.org/10.1117/12.805399

KEYWORDS: Photoresist materials, Finite-difference time-domain method, Lithography, 3D modeling, Metals, Plasmonics, Optical lithography, Visualization, Aluminum, Surface plasmon polaritons

Read Abstract +

Proceedings Article | 21 March 2008 Paper

Nano patterning with a single high-transmission nano-metal aperture system

Yongwoo Kim, Sinjeung Park, Eungman Lee, Jae Hahn

Proceedings Volume 6921, 69212C (2008) https://doi.org/10.1117/12.774485

KEYWORDS: Metals, Lithography, Optical lithography, Near field optics, Aluminum, Near field, Light sources, Objectives, Microscopes, Solids

Read Abstract +

Proceedings Article | 14 February 2008 Paper

Uncertainty analysis on optical testing with a Shack-Hartmann sensor and a point source

Dong Won Kang, Jin Seok Lee, Ho-Soon Yang, Jae Won Hahn

Proceedings Volume 6884, 68840U (2008) https://doi.org/10.1117/12.762505

KEYWORDS: Optical testing, Wavefronts, Relays, Calibration, Wavefront sensors, Sensors, Charge-coupled devices, Spherical lenses, Microlens array, Digital video discs

Read Abstract +

Proceedings Article | 14 February 2008 Paper

Temporal and spectral analysis of laser induced plasma in the ablation process of flexible printed circuit board

Hoon Ryoo, Seok Kim, Jae Hahn

Proceedings Volume 6879, 68791N (2008) https://doi.org/10.1117/12.762025

KEYWORDS: Plasma, Copper, Laser ablation, Laser induced breakdown spectroscopy, Plasma generation, Laser processing, Pulsed laser operation, Polymers, Signal to noise ratio, Flex printed circuits

Read Abstract +

Proceedings Article | 21 March 2007 Paper

Spectrally investigated optimization for high optical transmission of the C-shaped nano apertures

Eungman Lee, Kyoungsik Kim, Jae W. Hahn

Proceedings Volume 6517, 651721 (2007) https://doi.org/10.1117/12.712518

KEYWORDS: Metals, Near field, Aluminum, Silver, Near field optics, Transmittance, Finite-difference time-domain method, Light wave propagation, Optical lithography, Laser applications

Read Abstract +

Proceedings Article | 15 March 2007 Paper

Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

Yunmi Lee, Sinjeung Park, Eungman Lee, Kyoungsik Kim, Jae Hahn

Proceedings Volume 6517, 651722 (2007) https://doi.org/10.1117/12.712522

KEYWORDS: Aluminum, Surface plasmons, Polymethylmethacrylate, Metals, Lithography, Photomasks, Fringe analysis, Photoresist materials, Light wave propagation, Finite-difference time-domain method

Read Abstract +

Proceedings Article | 4 October 2001 Paper

Inspection system for microelectronics BGA package using wavelength scanning interferometry

Chul-moo Kang, Hyun Woo, Hyungsuck Cho, Jae Han, Jae-Yong Lee

Proceedings Volume 4564, (2001) https://doi.org/10.1117/12.444114

KEYWORDS: Interferometry, 3D metrology, Fourier transforms, CCD cameras, Inspection, Optical testing, Charge-coupled devices, Interferometers, Mirrors, Tunable lasers

Read Abstract +

Inspection and shape measurement of three-dimensional objects are widely needed in industries for quality monitoring and control. A number of visual or optical technologies have been successfully applied to measure three dimensional surfaces. Especially, the shape measurement using an interferometric principle becomes a successful methodology. However, those conventional interferometric methods to measure surface profile have an inherent shortcoming, namely 2π ambiguity problem. The problem inevitably happens when the object to be measured has discontinuous shape due to the repetition of interferometric signal with phase period of 2π . Therefore, in this paper, we choose as a shape measuring method Wavelength Shifting Interferometer (WSI) in which the absolute distance from the reference surface can be directly obtained from the amount of interferometric phase change. With the above advantage the coplanarity of ball grid array (BGA) can be easily evaluated and inspected, which is the major factor in the BGA surface mounting technology. The WSI is basically composed of a Twyman Green Interferometry and a tunable laser source. The proposed WSI so far by other researchers suffer from low measurement resolution because of the methodological roughness in obtaining interferometric phase change. Therefore, we propose a new algorithm, which can obtain a small amount of even fractional phase change by sinusoidal function fitting. To evaluate the effectiveness of the proposed sinusoidal function fitting algorithm, a series of measurements is conducted for discontinuously shaped specimens which have various heights. The proposed algorithm shows much more enhanced measurement resolution than other existing conventional algorithms such as zero crossing algorithm and Fourier transform algorithm. To measure the three dimensional shape of ball grid array with WSI, a series of simulations was performed for a hemispherical ball model in which the diffuse surface conditions are considered. The simulation results show that the three dimensional shape of a ball can be measured using WSI for purpose of BGA product inspections.

Proceedings Article | 4 December 1998 Paper

New design of four-pass dye laser amplifier and suppression of amplified spontaneous emission

Jae Hahn, Yong Yoo, Eun Lee

Proceedings Volume 3491, (1998) https://doi.org/10.1117/12.328685

KEYWORDS: Amplifiers, Optical amplifiers, Dye lasers, Continuous wave operation, Diffraction gratings, Pulsed laser operation, Raman spectroscopy, Oxygen, Laser systems engineering

Read Abstract +

Showing 5 of 29 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years