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James Chen
at Cadence Design Systems Inc
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Publications (2)
Proceedings Article | 24 March 2017 Paper
Advanced application of pattern-aware OPC
James Chen, Shin-Shing Yeh, Alan Zhu, Bayram Yenikaya, Fan-Hsuan Hsu, Yung-Ching Mai, Lawrence Lin, Nelson Lai
Proceedings Volume 10147, 101471W (2017) https://doi.org/10.1117/12.2258331
KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Model-based design, SRAF, Lithography, Process control, Computational lithography, Pattern recognition, Yield improvement, 193nm lithography, Optical lithography
Proceedings Article | 31 March 2014 Paper
Study of the pattern aware OPC
Shin-Shing Yeh, Alan Zhu, James Chen, Bayram Yenikaya, Yi-Shiang Chang, Chia-Chi Lin
Proceedings Volume 9052, 90521Y (2014) https://doi.org/10.1117/12.2046059
KEYWORDS: Optical proximity correction, Nanoimprint lithography, Resolution enhancement technologies, Control systems, Logic devices, Sensors, Lithography, Image quality, Metals, Process control
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