CONFERENCE PROCEEDINGS
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Alan Zhu
Engineering Director at Cadence Design Systems Inc
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Author
Publications (4)
Proceedings Article | 10 April 2024 Presentation + Paper
Synthesizing ILT MB-SRAF using machine learning
Ferhat Turker Celepcikay, Chun-Cheng Liao, Teng-Yen Huang, Szu-Ping Chen, Chi Neng Lin, Alan Zhu, Hung Yu Lin
Proceedings Volume 12954, 129540H (2024) https://doi.org/10.1117/12.3010902
KEYWORDS: SRAF, Machine learning, Resolution enhancement technologies, Lithography, Image quality, Optical proximity correction
Proceedings Article | 24 March 2017 Paper
Advanced application of pattern-aware OPC
James Chen, Shin-Shing Yeh, Alan Zhu, Bayram Yenikaya, Fan-Hsuan Hsu, Yung-Ching Mai, Lawrence Lin, Nelson Lai
Proceedings Volume 10147, 101471W (2017) https://doi.org/10.1117/12.2258331
KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Model-based design, SRAF, Lithography, Process control, Computational lithography, Pattern recognition, Yield improvement, 193nm lithography, Optical lithography
Proceedings Article | 31 March 2014 Paper
Study of the pattern aware OPC
Shin-Shing Yeh, Alan Zhu, James Chen, Bayram Yenikaya, Yi-Shiang Chang, Chia-Chi Lin
Proceedings Volume 9052, 90521Y (2014) https://doi.org/10.1117/12.2046059
KEYWORDS: Optical proximity correction, Nanoimprint lithography, Resolution enhancement technologies, Control systems, Logic devices, Sensors, Lithography, Image quality, Metals, Process control
Proceedings Article | 30 October 2007 Paper
Polygon-based compensation of proximity and density effects in photomask processes
Kiyoshi Kageyama, Katsuyuki Miyoko, Yoshimitsu Okuda, Gökhan Perçin, Apo Sezginer, Jesus Carrero, Alan Zhu, Anwei Liu
Proceedings Volume 6730, 67302Y (2007) https://doi.org/10.1117/12.746796
KEYWORDS: Photomasks, Databases, Calibration, Process modeling, Critical dimension metrology, Data modeling, Semiconducting wafers, Glasses, Etching, Model-based design
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