Mr. Kiyoshi Kageyama Profile

Kiyoshi Kageyama

at Toppan Photomask Co., LTD.

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 12 November 2024 Presentation + Paper

Mask performance improvement by pixel level dose correction

Mayuko Matsumoto, Naoki Yoshida, Tetsunori Hirata, Makoto Motegi, Kiyoshi Kageyama, Mitsuharu Yamana, Wataru Kunishima, Ryo Iikubo

Proceedings Volume 13216, 132160H (2024) https://doi.org/10.1117/12.3034611

KEYWORDS: Error control coding, Critical dimension metrology, Line edge roughness, Design, Semiconducting wafers, Extreme ultraviolet, Optical lithography, Photomasks, Modulation, Electron beam lithography

Read Abstract +

Proceedings Article | 26 September 2019 Paper

Evaluation of neighborhood pattern matching algorithm in MPC processing

Kohei Yanagisawa, Kota Kobayashi, Kiyoshi Kageyama, Sebastian Munoz, Fabian Saso, Parikshit Kulkarni, John Valadez, Kokoro Kato

Proceedings Volume 11148, 111481K (2019) https://doi.org/10.1117/12.2538626

KEYWORDS: Process modeling, Manufacturing, Algorithm development, Software development, Photomasks, Optical proximity correction, Time metrology

Read Abstract +

Proceedings Article | 27 June 2019 Paper

MPC model sensitivity analysis: model ambit vs. correction runtime

Alex Zepka, John Valadez, Parikshit Kulkarni, Kohei Yanagisawa, Kota Kobayashi, Kiyoshi Kageyama

Proceedings Volume 11178, 1117808 (2019) https://doi.org/10.1117/12.2535707

KEYWORDS: Photomasks, Data modeling, Calibration, Metrology, Etching, Electrons, Lithography, Optical proximity correction, Cadmium, Semiconducting wafers

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Layout driven DNIR

Kiyoshi Kageyama, Kohei Yanagisawa, Atsushi Kobayashi, Shinji Kunitani, Yoji Tonooka

Proceedings Volume 7122, 71223H (2008) https://doi.org/10.1117/12.801940

KEYWORDS: Inspection, Photomasks, Manufacturing, Optical proximity correction, Scattering, Neodymium, Printing, Carbon monoxide, Semiconductors, Photomask technology

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Polygon-based compensation of proximity and density effects in photomask processes

Kiyoshi Kageyama, Katsuyuki Miyoko, Yoshimitsu Okuda, Gökhan Perçin, Apo Sezginer, Jesus Carrero, Alan Zhu, Anwei Liu

Proceedings Volume 6730, 67302Y (2007) https://doi.org/10.1117/12.746796

KEYWORDS: Photomasks, Databases, Calibration, Process modeling, Critical dimension metrology, Data modeling, Semiconducting wafers, Glasses, Etching, Model-based design

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years