Dr. Markos Trikeriotis Profile

Dr. Markos Trikeriotis

at Cornell Univ

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Author

Publications (7)

Proceedings Article | 1 April 2013 Paper

Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Souvik Chakrabarty, Christine Ouyang, Marie Krysak, Markos Trikeriotis, Kyoungyoung Cho, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 8679, 867906 (2013) https://doi.org/10.1117/12.2011490

KEYWORDS: Nanoparticles, Photoresist materials, Electron beam lithography, Oxides, Spectroscopy, Ions, Extreme ultraviolet lithography, Optical lithography, Carbon, Photoresist developing

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Proceedings Article | 23 March 2012 Paper

A new inorganic EUV resist with high-etch resistance

Markos Trikeriotis, Marie Krysak, Yeon Sook Chung, Christine Ouyang, Brian Cardineau, Robert Brainard, Christopher Ober, Emmanuel Giannelis, Kyoungyong Cho

Proceedings Volume 8322, 83220U (2012) https://doi.org/10.1117/12.916384

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Etching, Nanoparticles, Resistance, Extreme ultraviolet, Absorbance, Electron beam lithography, Line edge roughness, Hafnium

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Proceedings Article | 23 March 2012 Paper

Tightly bound ligands for hafnium nanoparticle EUV resists

Brian Cardineau, Marie Krysak, Markos Trikeriotis, Emmanuel Giannelis, Christopher Ober, Kyoungyong Cho, Robert Brainard

Proceedings Volume 8322, 83220V (2012) https://doi.org/10.1117/12.917014

KEYWORDS: Nanoparticles, Hafnium, Solids, Sodium, Lithography, Extreme ultraviolet, Oxides, Crystals, Magnetism, Bioalcohols

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Proceedings Article | 16 April 2011 Paper

Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography

Marie Krysak, Markos Trikeriotis, Evan Schwartz, Neal Lafferty, Peng Xie, Bruce Smith, Paul Zimmerman, Warren Montgomery, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 7972, 79721C (2011) https://doi.org/10.1117/12.879385

KEYWORDS: Etching, Nanoparticles, Resistance, Oxides, Photoresist materials, Electron beam lithography, Hafnium, Lithography, Extreme ultraviolet lithography, Refractive index

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Proceedings Article | 26 March 2010 Paper

Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

Markos Trikeriotis, Woo Jin Bae, Evan Schwartz, Marie Krysak, Neal Lafferty, Peng Xie, Bruce Smith, Paul Zimmerman, Christopher Ober, Emmanuel Giannelis

Proceedings Volume 7639, 76390E (2010) https://doi.org/10.1117/12.846672

KEYWORDS: Nanoparticles, Photoresist materials, Electron beam lithography, Etching, Hafnium, Resistance, Oxides, Photoresist developing, Deep ultraviolet, Refractive index

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Proceedings Article | 1 April 2009 Paper

High-index nanocomposite photoresist for 193-nm lithography

Woo Jin Bae, Makros Trikeriotis, Robert Rodriguez, Michael Zettel, Emil Piscani, Christopher Ober, Emmanuel Giannelis, Paul Zimmerman

Proceedings Volume 7273, 727326 (2009) https://doi.org/10.1117/12.814154

KEYWORDS: Nanoparticles, Photoresist materials, Refractive index, Water, Ultraviolet radiation, Nanocomposites, Lithography, Immersion lithography, Semiconducting wafers, Absorption

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Proceedings Article | 1 April 2009 Paper

High refractive index nanoparticle fluids for 193-nm immersion lithography

Markos Trikeriotis, Robert Rodriguez, Michael Zettel, Aristeidis Bakandritsos, Woo Jin Bae, Paul Zimmerman, Christopher Ober, Emmanuel Giannelis

Proceedings Volume 7273, 72732A (2009) https://doi.org/10.1117/12.814408

KEYWORDS: Refractive index, Nanoparticles, Water, Immersion lithography, Hafnium, Particles, Absorption, Oxides, Fluid dynamics, Dynamic light scattering

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Showing 5 of 7 publications

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