Dr. Nobuyuki N. Matsuzawa Profile

Dr. Nobuyuki N. Matsuzawa

Principal Engineer & Director at Panasonic Industry Co Ltd

SPIE Involvement:

Conference Program Committee | Author

Proceedings Article | 29 March 2006 Paper

Optimization of dual BARC structures for hyper-NA immersion lithography

Nobuyuki Matsuzawa, Boontarika Thunnakart, Ken Ozawa, Yuko Yamaguchi, Hiroyuki Nakano, Hiroichi Kawahira

Proceedings Volume 6153, 61531J (2006) https://doi.org/10.1117/12.651563

KEYWORDS: Silicon, Reflectivity, Oxides, Refractive index, Immersion lithography, Photoresist materials, Lithography, Optimization (mathematics), Polarization, Semiconductors

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR

Hiroichi Kawahira, Nobuyuki Matsuzawa, Eriko Matsui, Atsuhiro Ando, Kazi M. A. Salam, Masashi Yoshida, Yuko Yamaguchi, Katsuhisa Kugimiya, Tetsuya Tatsumi, Hiroyuki Nakano, Takeshi Iwai, Makiko Irie

Proceedings Volume 6153, 615319 (2006) https://doi.org/10.1117/12.656002

KEYWORDS: Line width roughness, Photoresist materials, Etching, Plasma, Plasma treatment, Chemical analysis, FT-IR spectroscopy, Polymers, Lithography, Semiconducting wafers

Read Abstract +

Proceedings Article | 24 August 2001 Paper

Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region

Nobuyuki Matsuzawa, Akihiko Ishitani, David Dixon, Tsuyoshi Uda

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436871

KEYWORDS: Absorbance, Molecules, Polymers, Lithography, Vacuum ultraviolet, Fluorine, Absorption, Photoresist materials, Polymethylmethacrylate, Oscillators

Read Abstract +

Proceedings Article | 24 August 2001 Paper

Control of line edge roughness of ultrathin resist films subjected to EUV exposure

Manhyoung Ryoo, Shigeru Shirayone, Hiroaki Oizumi, Nobuyuki Matsuzawa, Shigeo Irie, Ei Yano, Shinji Okazaki

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436814

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Thin films, Lithography, Extreme ultraviolet, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Atomic force microscope, Image processing

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region

Nobuyuki Matsuzawa, Shigeo Irie, Ei Yano, Shinji Okazaki, Akihiko Ishitani

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436657

KEYWORDS: Polymers, Absorption, Oxygen, Chemical species, Silicon, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Carbon

Read Abstract +

Proceedings Article | 23 June 2000 Paper

Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region

Nobuyuki Matsuzawa, Shigeyasu Mori, Ei Yano, Shinji Okazaki, Akihiko Ishitani, David Dixon

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388321

KEYWORDS: Lithography, Polymers, Photoresist materials, Absorption, Vacuum ultraviolet, Absorbance, Molecules, Copper indium disulfide, Opacity, Polymethylmethacrylate

Read Abstract +