Dr. Shinji Okazaki Profile

Dr. Shinji Okazaki

SPIE Involvement:

Conference Program Committee | Author

Publications (54)

Proceedings Article | 27 March 2017 Presentation + Paper

Presentation + Paper

Performance of 250W high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10143, 101431J (2017) https://doi.org/10.1117/12.2256652

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Light sources, Lithography, Extreme ultraviolet lithography, Plasma, Tin, Pulsed laser operation, Laser development, Gas lasers, Carbon monoxide, Amplifiers

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Proceedings Article | 24 March 2017 Paper

Paper

Key components technology update of the 250W high-power LPP-EUV light source

Yasufumi Kawasuji, Krzysztof Nowak, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi, Yutaka Shiraishi

Proceedings Volume 10143, 101432G (2017) https://doi.org/10.1117/12.2257808

KEYWORDS: Carbon dioxide lasers, Light sources, Pulsed laser operation, Tin, Extreme ultraviolet, High power lasers, Solid state lasers, Magnetism, Gas lasers, Carbon monoxide, Laser applications, Amplifiers, Semiconductors

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Proceedings Article | 22 February 2017 Open Access

Open Access

Paper

Development of 250W EUV light source for HVM lithography

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji,, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10097, 1009702 (2017) https://doi.org/10.1117/12.2261075

KEYWORDS: Extreme ultraviolet, Light sources, Lithography, Carbon dioxide lasers, Tin, Extreme ultraviolet lithography, Gas lasers, Carbon monoxide, Amplifiers, Plasma, Pulsed laser operation, Mirrors

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Proceedings Article | 18 March 2016 Paper

Paper

Performance of new high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9776, 97760J (2016) https://doi.org/10.1117/12.2218405

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Lithography, High power lasers, Carbon dioxide, Laser systems engineering, Amplifiers, Tin, Pulsed laser operation, Light sources, Plasma, Magnetism, Extreme ultraviolet lithography, Ions

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Proceedings Article | 18 March 2016 Paper

Paper

100W EUV light-source key component technology update for HVM

Tsukasa Hori, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tamotsu Abe, Takeshi Okamoto, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 9776, 977625 (2016) https://doi.org/10.1117/12.2217947

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Plasma, Light sources, Laser systems engineering, High power lasers, Control systems, Mirrors, Lithography, Ions

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Proceedings Article | 13 March 2015 Paper

Paper

Performance of one hundred watt HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9422, 94220C (2015) https://doi.org/10.1117/12.2086347

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Pulsed laser operation, Laser systems engineering, Magnetism, Mirrors, Ions

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Proceedings Article | 13 March 2015 Paper

Paper

Key components technology update of 100W HVM EUV source

Taku Yamazaki, Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9422, 94222P (2015) https://doi.org/10.1117/12.2180269

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Light sources, Magnetism, Mirrors, Ions, Carbon dioxide, Laser applications

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Proceedings Article | 17 April 2014 Paper

Paper

Sub-hundred Watt operation demonstration of HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9048, 90480D (2014) https://doi.org/10.1117/12.2046776

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Light sources, Plasma, Pulsed laser operation, Amplifiers, Laser systems engineering, Magnetism

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Since 2002, we have been developing a CO₂-Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma. Our group has proposed several unique original technologies; 1) CO₂ laser driven Sn plasma generation, 2) Double laser pulse shooting for higher Sn ionization rate and higher CE. 3) Sn debris mitigation with a magnetic field, 4) Hybrid CO₂ laser system that is scalable with a combination of a short pulse oscillator and commercial cw-CO₂ amplifiers. 5) High efficient out of band light reduction with grating structured C1 mirror. In past paper we demonstrated in small size (2Hz) experimental device, this experiment shoed the advantage of combining a laser beam at a wavelength of the CO₂ laser system with Sn plasma to achieve high CE>4.7% (in maximum) from driver laser pulse energy to EUV in-band energy ¹). In this paper we report the further updated results from last paper. (1) 20um droplets at 100kHz operation was successfully ejected by downsized nozzle and demonstrated dramatical improvement of debris on the collector mirror. We have been developing extension of high CE operation condition at 20kHz range, We have reported component technology progress of EUV light source system. (2)New generation collector mirror with IR reduction technology is equipped in mirror maker. (3)20kW CO₂ laser amplifier system is demonstrated cooperate with Mitsubishi electric. (4) We develop new Proto #2 EUV LPP source system and demonstrated 200W EUV plasma power (43W EUV clean power at I/F ) at 100kHz operation was confirmed. (5) High conversion efficiency (CE) of 3.9% at 20kHz operation was confirmed in using pico-second pre-pulse laser. (6)Improvement of CO₂ laser power from 8kW to 12kW is now on going by installation of new pre-amplifier. (7)Power-up scenario of HVM source is reported, target shipment of first customer beta LPP light source unit is 2015.

Proceedings Article | 8 April 2013 Paper

Paper

LPP-EUV light source development for high volume manufacturing lithography

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 8679, 86790A (2013) https://doi.org/10.1117/12.2014139

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Pulsed laser operation, Plasma, Magnetism, Chemical species, Laser systems engineering, Extreme ultraviolet lithography

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Proceedings Article | 13 March 2012 Paper

Paper

A reliable higher power ArF laser with advanced functionality for immersion lithography

Akihiko Kurosu, Masaki Nakano, Masanori Yashiro, Masaya Yoshino, Hiroaki Tsushima, Hiroyuki Masuda, Takahito Kumazaki, Shinichi Matsumoto, Kouji Kakizaki, Takashi Matsunaga, Shinji Okazaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 8326, 83261F (2012) https://doi.org/10.1117/12.916324

KEYWORDS: Excimer lasers, Control systems, Optical lithography, Laser drilling, Gas lasers, Laser development, Semiconducting wafers, Gemini Planet Imager, 193nm lithography, Manufacturing

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Proceedings Article | 19 January 2005 Paper

Paper

Recent development activities and future plans for EUV lithography in Japan

Shinji Okazaki

Proceedings Volume 5592, (2005) https://doi.org/10.1117/12.570969

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Light sources, Extreme ultraviolet, Metrology, Photoresist processing, Lithography, Inspection, Polymers, Reflectivity

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Proceedings Article | 18 October 2004 Paper

Paper

Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA

Tetsuya Oshino, Shin-ichi Takahashi, Takahiro Yamamoto, Tatsuro Miyoshi, Masayuki Shiraishi, Takaharu Komiya, Noriaki Kandaka, Hiroyuki Kondo, Kiyoto Mashima, Kazushi Nomura, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.559210

KEYWORDS: Mirrors, Wavefronts, Projection systems, Polishing, Semiconducting wafers, Extreme ultraviolet lithography, Spatial frequencies, Photomasks, Coating, Mirror mounts

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Proceedings Article | 20 May 2004 Paper

Paper

Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics

Tetsuya Oshino, Takahiro Yamamoto, Tatsuro Miyoshi, Masayuki Shiraishi, Takaharu Komiya, Noriaki Kandaka, Hiroyuki Kondo, Kiyoto Mashima, Kazushi Nomura, Katsuhiko Murakami, Hiroaki Oizumi, Isa Nishiyama, Shinji Okazaki

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.562365

KEYWORDS: Mirrors, Wavefronts, Projection systems, Spatial frequencies, Semiconducting wafers, Polishing, Extreme ultraviolet lithography, Photomasks, Mirror mounts, Reflectivity

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Proceedings Article | 16 June 2003 Paper

Paper

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Tetsuya Oshino, Masayuki Shiraishi, Noriaki Kandaka, Katsumi Sugisaki, Hiroyuki Kondo, Kazuya Ota, K. Mashima, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484936

KEYWORDS: Mirrors, Projection systems, Wavefronts, Extreme ultraviolet lithography, Spherical lenses, Metals, Mirror mounts, Optical components, Lithographic illumination, Photography

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SPIE Journal Paper | 1 April 2003

Simulation model of in-plane distortion in extreme ultraviolet lithography mask during chucking without friction

Akira Chiba, Eiichi Hoshino, Minoru Sugawara, Hiromasa Yamanashi, Kazuya Ota, Taro Ogawa, Shinji Okazaki

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1563645

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Multilayers, Distortion, Mathematical modeling, Interfaces, Glasses, Tantalum, Error analysis, Quartz

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SPIE Journal Paper | 1 January 2003

Pattern printability for off-axis incident light in extreme ultraviolet lithography

Minoru Sugawara, Masaaki Ito, Taro Ogawa, Eiichi Hoshino, Akira Chiba, Shinji Okazaki

JM3, Vol. 2, Issue 01, (January 2003) https://doi.org/10.1117/12.10.1117/1.1530571

KEYWORDS: Optical proximity correction, Photomasks, Critical dimension metrology, Semiconducting wafers, Nanoimprint lithography, Extreme ultraviolet lithography, Ruthenium, Head, Optical calibration, Monochromatic aberrations

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Proceedings Article | 1 August 2002 Paper

Paper

Pattern printability for reflectance degradation of Mo/Si mask blanks in EUV lithography

Minoru Sugawara, Masaaki Ito, Akira Chiba, Eiichi Hoshino, Hiromasa Yamanashi, Hiromasa Hoko, Taro Ogawa, Byoung Lee, Takashi Yoneda, Masashi Takahashi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476991

KEYWORDS: Reflectivity, Photomasks, Binary data, Molybdenum, Silicon, Extreme ultraviolet lithography, Phase shifts, Semiconducting wafers, Ruthenium, Mirrors

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Proceedings Article | 1 July 2002 Paper

Paper

Impact of EUV light scatter on CD control as a result of mask density changes

Christof Krautschik, Masaaki Ito, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472302

KEYWORDS: Mirrors, Critical dimension metrology, Chromium, Surface roughness, Point spread functions, Extreme ultraviolet, Light scattering, Spatial frequencies, Scattering, Control systems

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Proceedings Article | 1 July 2002 Paper

Paper

Aspherical mirror measurement using a point diffraction interferometer

Kazuya Ota, Takahiro Yamamoto, Yusuke Fukuda, Katsura Otaki, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472343

KEYWORDS: Mirrors, Extreme ultraviolet, Error analysis, Spherical lenses, Point diffraction interferometers, Projection systems, Distance measurement, Interferometry, Wavefronts, Aspheric lenses

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Proceedings Article | 1 July 2002 Paper

Paper

Simulation model of in-plane distortion in EUVL mask during chucking

Akira Chiba, Kazuya Ota, Eiichi Hoshino, Minoru Sugawara, Taro Ogawa, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472348

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Free space, Distortion, Mathematical modeling, Image processing, Finite element methods, Finite difference methods, Lithography

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Proceedings Article | 1 July 2002 Paper

Paper

Pattern printability for off-axis incident light in EUV lithography

Minoru Sugawara, Masaaki Ito, Taro Ogawa, Eiichi Hoshino, Akira Chiba, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472301

KEYWORDS: Optical proximity correction, Critical dimension metrology, Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Charge-coupled devices, Ruthenium, Semiconducting wafers, Optical calibration, Monochromatic aberrations

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Proceedings Article | 1 July 2002 Paper

Paper

Fine pattern replication on 10 x 10-mm exposure area using ETS-1 laboratory tool in HIT

K. Hamamoto, Takeo Watanabe, Hideo Hada, Hiroshi Komano, Shinji Kishimura, Shinji Okazaki, Hiroo Kinoshita

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472272

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Wafer-level optics, Chemically amplified resists, Mirrors, Chromium, Edge roughness, Silicon, Scanning electron microscopy

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Proceedings Article | 1 July 2002 Paper

Paper

Simulation studies of roughness-smoothing effect of molybdenum/silicon multilayer coating based on resputtering model

Taro Ogawa, Masaaki Ito, Hiromasa Yamanashi, Hiromasa Hoko, Eiichi Hoshino, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472346

KEYWORDS: Molybdenum, Multilayers, Silicon, Chemical species, Sputter deposition, Extreme ultraviolet lithography, Coating, Transmission electron microscopy, Argon, Photomasks

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Proceedings Article | 1 July 2002 Paper

Paper

Fabrication of Mo/Si multilayer for EUVL reticle blank using ion beam sputtering

Hiromasa Yamanashi, Taro Ogawa, Hiromasa Hoko, Byoung Lee, Eiichi Hoshino, Masashi Takahashi, Takashi Yoneda, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472345

KEYWORDS: Multilayers, Sputter deposition, Extreme ultraviolet lithography, Reflectivity, Ion beams, Extreme ultraviolet, Reticles, Photomasks, Silicon, Molybdenum

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Proceedings Article | 5 September 2001 Paper

Paper

Thermal response of EUVL mask substrate during dry etching process

Akira Chiba, Eiichi Hoshino, Makoto Takahashi, Hiromasa Yamanashi, Hiromasa Hoko, Byoung Lee, Takashi Yoneda, Masaaki Ito, Taro Ogawa, Shinji Okazaki

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438369

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Dry etching, Silicon, Semiconducting wafers, Glasses, Temperature metrology, Quartz, Multilayers, Reflectivity

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Proceedings Article | 5 September 2001 Paper

Paper

Simulation of EUVL mask defect printability

Manhyoung Ryoo, Masaaki Ito, Byoung Lee, Taro Ogawa, Shinji Okazaki

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438371

KEYWORDS: Reflectivity, Photomasks, Opacity, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Computer simulations, Lithographic illumination, Critical dimension metrology, Device simulation

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Proceedings Article | 24 August 2001 Paper

Paper

Control of line edge roughness of ultrathin resist films subjected to EUV exposure

Manhyoung Ryoo, Shigeru Shirayone, Hiroaki Oizumi, Nobuyuki Matsuzawa, Shigeo Irie, Ei Yano, Shinji Okazaki

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436814

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Thin films, Lithography, Extreme ultraviolet, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Atomic force microscope, Image processing

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Proceedings Article | 20 August 2001 Paper

Paper

Characteristics of the Ru buffer layer for EUVL mask patterning

Byoung Lee, Eiichi Hoshino, Masashi Takahashi, Takashi Yoneda, Hiromasa Yamanashi, Hiromasa Hoko, Akira Chiba, Masaaki Ito, Manhyoung Ryoo, Taro Ogawa, Shinji Okazaki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436699

KEYWORDS: Ruthenium, Etching, Photomasks, Multilayers, Inspection, Optical lithography, Extreme ultraviolet lithography, Amorphous silicon, Reflectivity, Deep ultraviolet

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Proceedings Article | 20 August 2001 Paper

Paper

Advanced point diffraction interferometer for EUV aspherical mirrors

Kazuya Ota, Takahiro Yamamoto, Yusuke Fukuda, Katsura Otaki, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436686

KEYWORDS: Mirrors, Extreme ultraviolet, Helium, Point diffraction interferometers, Interferometers, Wavefront aberrations, Objectives, Spherical lenses, Wavefronts, Phase shifting

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Proceedings Article | 20 August 2001 Paper

Paper

Tantalum nitride films for the absorber material of refractive-type EUVL mask

Masashi Takahashi, Taro Ogawa, Eiichi Hoshino, Hiromasa Hoko, Byoung Lee, Akira Chiba, Hiromasa Yamanashi, Shinji Okazaki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436702

KEYWORDS: Tantalum, Deep ultraviolet, Reflectivity, Sputter deposition, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Multilayers, Silicon, Absorbance

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Proceedings Article | 20 August 2001 Paper

Paper

Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region

Nobuyuki Matsuzawa, Shigeo Irie, Ei Yano, Shinji Okazaki, Akihiko Ishitani

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436657

KEYWORDS: Polymers, Absorption, Oxygen, Chemical species, Silicon, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Carbon

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Proceedings Article | 9 April 2001 Paper

Paper

Removal process for buffer layer on multilayer of EUVL mask

Eiichi Hoshino, Taro Ogawa, Masashi Takahashi, Hiromasa Hoko, Hiromasa Yamanashi, Naoya Hirano, Akira Chiba, Byoung Lee, Masaaki Ito, Shinji Okazaki

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425097

KEYWORDS: Etching, Extreme ultraviolet lithography, Photomasks, Manufacturing, Multilayers, Wet etching, Deep ultraviolet, Microscopes, Inspection, Reflectivity

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Proceedings Article | 22 January 2001 Paper

Paper

Dry etching of Ta absorber for EUVL masks

Eiichi Hoshino, Taro Ogawa, Naoya Hirano, Hiromasa Hoko, Masashi Takahashi, Hiromasa Yamanashi, Akira Chiba, Masaaki Ito, Shinji Okazaki

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410755

KEYWORDS: Tantalum, Photomasks, Etching, Dry etching, Extreme ultraviolet lithography, Semiconducting wafers, Silicon, Chlorine, Glasses, Plasma etching

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Proceedings Article | 21 July 2000 Paper

Paper

Recent advances of three-aspherical-mirror system for EUVL

Hiroo Kinoshita, Takeo Watanabe, Yanqiu Li, Atsushi Miyafuji, Tetsuya Oshino, Katsumi Sugisaki, Katsuhiko Murakami, Shigeo Irie, Shigeru Shirayone, Shinji Okazaki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390091

KEYWORDS: Mirrors, Extreme ultraviolet lithography, Interferometers, Multilayers, Optical alignment, Phase shifts, Reflectivity, Wavefronts, Coating, Imaging systems

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Proceedings Article | 21 July 2000 Paper

Paper

Smooth low-stress sputtered tantalum and tantalum alloy films for the absorber material of reflective-type EUVL

Masashi Takahashi, Taro Ogawa, Hiromasa Hoko, Eiichi Hoshino, Hiromasa Yamanashi, Naoya Hirano, Akira Chiba, Shinji Okazaki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390087

KEYWORDS: Tantalum, Sputter deposition, Photomasks, Extreme ultraviolet lithography, Reflectivity, Deep ultraviolet, Argon, Surface roughness, Inspection, Extreme ultraviolet

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Proceedings Article | 19 July 2000 Paper

Paper

Surface preparation of EUVL mask substrate for multilayer coating by supersonic hydrocleaning technique

Naoya Hirano, Hiromasa Hoko, Eiichi Hoshino, Taro Ogawa, Akira Chiba, Hiromasa Yamanashi, Masashi Takahashi, Shinji Okazaki

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392046

KEYWORDS: Particles, Semiconducting wafers, Extreme ultraviolet lithography, Silicon, Photomasks, Ultraviolet radiation, Atmospheric particles, Pellicles, Natural surfaces, Coating

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Proceedings Article | 19 July 2000 Paper

Paper

Process scheme for removing buffer layer on multilayer for EUVL mask

Eiichi Hoshino, Taro Ogawa, Masashi Takahashi, Hiromasa Hoko, Hiromasa Yamanashi, Naoya Hirano, Akira Chiba, Masaaki Ito, Shinji Okazaki

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392050

KEYWORDS: Etching, Tantalum, Dry etching, Extreme ultraviolet lithography, Wet etching, Photomasks, Multilayers, HF etching, Yield improvement, Silicon

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Proceedings Article | 23 June 2000 Paper

Paper

Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region

Nobuyuki Matsuzawa, Shigeyasu Mori, Ei Yano, Shinji Okazaki, Akihiko Ishitani, David Dixon

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388321

KEYWORDS: Lithography, Polymers, Photoresist materials, Absorption, Vacuum ultraviolet, Absorbance, Molecules, Copper indium disulfide, Opacity, Polymethylmethacrylate

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Proceedings Article | 23 June 2000 Paper

Paper

Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation

Seiji Nagahara, Yusuke Sakurai, Masanori Wakita, Yukio Yamamoto, Seiichi Tagawa, Masanori Komuro, Ei Yano, Shinji Okazaki

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388322

KEYWORDS: Polymers, Amplifiers, Oxygen, Silver, Chemically amplified resists, Electrodes, Hydrogen, Photoresist processing, Electron beam lithography, Oxidation

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Proceedings Article | 30 December 1999 Paper

Paper

Damage control during dry etching of EUV mask: I. Control of surface roughness

Eiichi Hoshino, Taro Ogawa, Masashi Takahashi, Hiromasa Hoko, Hiromasa Yamanashi, Naoya Hirano, Shinji Okazaki

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373372

KEYWORDS: Etching, Tantalum, Dry etching, Photomasks, Surface roughness, Extreme ultraviolet, Silicon, Atomic force microscopy, Multilayers, Optical properties

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Proceedings Article | 19 July 1999 Paper

Paper

Future of optical lithography

Shinji Okazaki

Proceedings Volume 3749, (1999) https://doi.org/10.1117/12.354770

KEYWORDS: Optical lithography, Resolution enhancement technologies, Extreme ultraviolet lithography, Excimer lasers, Projection systems, Optical resolution, Light sources, Laser development, Electronics

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Proceedings Article | 25 June 1999 Paper

Paper

EUV lithography research program at ASET

Shinji Okazaki

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351095

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Photoresist processing, Mirrors, Metrology, Optical lithography, Imaging systems, Lithography, EUV optics, Materials processing

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Proceedings Article | 29 June 1998 Paper

Paper

Proposal of a composite phase-shifting mask for 0.15-um hole-pattern delineation using KrF exposure

Norio Hasegawa, Katsuya Hayano, Akira Imai, Naoko Asai, Shinji Okazaki

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310781

KEYWORDS: Phase shifts, Composites, Photomasks, Chromium, Transmittance, Modulation, Halftones, Opacity, Quartz, Etching

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Proceedings Article | 29 June 1998 Paper

Paper

Optimization of exposure procedures for sub-quarter-micron CMOS applications

Shoji Hotta, Toshihiko Onozuka, Keiko Fukumoto, Seiichiro Shirai, Shinji Okazaki

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310790

KEYWORDS: Critical dimension metrology, Binary data, Phase shifts, Halftones, Photomasks, Photoresist processing, Optical lithography, Logic devices, Semiconducting wafers, Materials processing

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Proceedings Article | 5 June 1998 Paper

Paper

Electron-beam direct writing technology for fine gate patterning

Kazuhiko Sato, Seiichiro Shirai, Hajime Hayakawa, Shinji Okazaki

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309586

KEYWORDS: Lithography, CMOS devices, Electron beam lithography, Beam shaping, Transistors, Semiconducting wafers, Process control, Electron beams, Laser scattering, Scattering

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SPIE Journal Paper | 1 October 1996

KrF excimer laser lithography with a phase-shifting mask for gigabit-scale ultra large scale integration

Akira Imai, Tsuneo Terasawa, Norio Hasegawa, Naoko Asai, Toshihiko Tanaka, Shinji Okazaki

OE, Vol. 35, Issue 10, (October 1996) https://doi.org/10.1117/12.10.1117/1.600980

KEYWORDS: Photomasks, Excimer lasers, Chromium, Lithography, Phase measurement, Phase shifts, Scanning electron microscopy, Optics manufacturing, Semiconducting wafers, Semiconductors

Proceedings Article | 7 June 1996 Paper

Paper

Wafer and chip deformation caused by pattern transfer

Akira Imai, Norio Hasegawa, Shinji Okazaki, Kouichi Sakaguchi

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240975

KEYWORDS: Semiconducting wafers, Silicon, Photomasks, Finite element methods, Image registration, Manufacturing, Resolution enhancement technologies, Semiconductors, Overlay metrology, Photoresist processing

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Proceedings Article | 3 July 1995 Paper

Paper

Phase-shifting masks for giga-scale ULSI

Akira Imai, Tsuneo Terasawa, Norio Hasegawa, Naoko Asai, Toshihiko Tanaka, Shinji Okazaki

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212800

KEYWORDS: Photomasks, Excimer lasers, Chromium, Phase measurement, Lithography, Optical simulations, Phase shifts, Scanning electron microscopy, Optical lithography, Device simulation

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Proceedings Article | 9 June 1995 Paper

Paper

Lithography for ULSI

Shinji Okazaki

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210342

KEYWORDS: Lithography, Optical lithography, X-ray lithography, Super resolution, Electron beams, X-rays, Photomasks, Overlay metrology, Semiconducting wafers, Chemically amplified resists

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Proceedings Article | 26 May 1995 Paper

Paper

Lithography for ULSI

Shinji Okazaki

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209245

KEYWORDS: Lithography, Optical lithography, X-ray lithography, Super resolution, Electron beams, X-rays, Photomasks, Overlay metrology, Semiconducting wafers, Chemically amplified resists

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Proceedings Article | 22 May 1995 Paper

Paper

Lithoraphy for ULSI

Shinji Okazaki

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209196

KEYWORDS: Lithography, Optical lithography, X-ray lithography, Super resolution, X-rays, Electron beams, Photomasks, Overlay metrology, Semiconducting wafers, Chemically amplified resists

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Proceedings Article | 19 May 1995 Paper

Paper

Lithography for ULSI

Shinji Okazaki

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209152

KEYWORDS: Lithography, Optical lithography, X-ray lithography, Super resolution, Electron beams, X-rays, Photomasks, Overlay metrology, Semiconducting wafers, Chemically amplified resists

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Proceedings Article | 1 August 1991 Paper

Paper

Investigation on the effect of electron-beam acceleration voltage and electron-beam sharpness on 0.2-um patterns

Akemi Moniwa, Shinji Okazaki

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47352

KEYWORDS: Silicon, Monte Carlo methods, Electron beams, Photoresist processing, X-ray lithography, X-rays, Manufacturing, Ion beams, Optical simulations, Computer simulations

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Proceedings Article | 1 June 1990 Paper

Paper

Phase-shifting mask and FLEX method for advanced photolithography

Hiroshi Fukuda, Akira Imai, Shinji Okazaki

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20176

KEYWORDS: Phase shifts, Photoresist processing, Image processing, Optical lithography, Image quality, Excimer lasers, Image acquisition, Image resolution, Spatial frequencies, Photomasks

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Showing 5 of 54 publications

Conference Committee Involvement (18)

International Conference on Extreme Ultraviolet Lithography 2024

30 September 2024 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2023

2 October 2023 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2022

26 September 2022 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2021

27 September 2021 | Online Only, United States

Extreme Ultraviolet (EUV) Lithography XII

22 February 2021 | Online Only, California, United States

Extreme Ultraviolet (EUV) Lithography XI

24 February 2020 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography X

25 February 2019 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography IX

26 February 2018 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VIII

27 February 2017 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VII

22 February 2016 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VI

23 February 2015 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography V

24 February 2014 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography IV

25 February 2013 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography III

13 February 2012 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography II

28 February 2011 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography

22 February 2010 | San Jose, California, United States

Alternative Lithographic Technologies

24 February 2009 | San Jose, California, United States

Emerging Lithographic Technologies XII

26 February 2008 | San Jose, California, United States

Showing 5 of 18 Conference Committees

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