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Terry A. Johnson
Sr Member Technical Staff at Sandia National Labs California
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Publications (6)
Proceedings Article | 14 October 2004 Paper
Zirconium and niobium transmission data at wavelengths from 11-16 nm and 200-1200 nm
Proceedings Volume 5538, (2004) https://doi.org/10.1117/12.564259
KEYWORDS: Zirconium, Niobium, Transmittance, Extreme ultraviolet, Optical filters, Extreme ultraviolet lithography, Refractive index, Nickel, Metals, Carbon
Proceedings Article | 16 June 2003 Paper
Lithographic characterization of improved projection optics in the EUVL engineering test stand
Donna O'Connell, Sang Hun Lee, William Ballard, Daniel Tichenor, Louis Bernardez, Steven Haney, Terry Johnson, Pamela Barr, Alvin Leung, Karen Jefferson, William Replogle, John Goldsmith, Henry Chapman, Patrick Naulleau, Stefan Wurm, Eric Panning
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484967
KEYWORDS: Projection systems, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Line edge roughness, Reticles, Wavefronts
Proceedings Article | 16 June 2003 Paper
System and process learning in a full-field high-power EUVL alpha tool
William Ballard, Daniel Tichenor, Donna O'Connell, Luis Bernardez, Robert Lafon, Richard Anderson, Alvin Leung, Kenneth Williams, Steven Haney, Yon Perras, Karen Jefferson, Therese Porter, Daniel Knight, Pamela Barr, James Van de Vreugde, Richard Campiotti, Mark Zimmerman, Terry Johnson, Leonard Klebanoff, Philip Grunow, Samuel Graham, Dean Buchenauer, William Replogle, Tony Smith, John Wronosky, Joel Darnold, Kenneth Blaedel, Henry Chapman, John Taylor, Layton Hale, Gary Sommargren, Eric Gullikson, Patrick Naulleau, Kenneth Goldberg, Sang Hun Lee, Harry Shields, Randall St. Pierre, Samuel Ponti
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482791
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Sensors, Extreme ultraviolet lithography, Lithography, Projection systems, Xenon, EUV optics, Fiber optic illuminators
Proceedings Article | 1 July 2002 Paper
Lithographic evaluation of the EUV engineering test stand
Sang Hun Lee, Daniel Tichenor, William Ballard, Luis Bernardez, John Goldsmith, Steven Haney, Karen Jefferson, Terry Johnson, Alvin Leung, Donna O'Connell, William Replogle, John Wronosky, Kenneth Blaedel, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Henry Chapman, Stefan Wurm, Eric Panning, Pei-yang Yan, Guojing Zhang, John Bjorkholm, Glenn Kubiak, Donald Sweeney, David Attwood, Charles Gwyn
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472300
KEYWORDS: Extreme ultraviolet, Lithography, Projection systems, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Reticles, Printing, Point spread functions, Image resolution
Proceedings Article | 1 July 2002 Paper
Performance upgrades in the EUV engineering test stand
Daniel Tichenor, William Replogle, Sang Hun Lee, William Ballard, Alvin Leung, Glenn Kubiak, Leonard Klebanoff, Samual Graham, John Goldsmith, Karen Jefferson, John Wronosky, Tony Smith, Terry Johnson, Harry Shields, Layton Hale, Henry Chapman, John Taylor, Donald Sweeney, James Folta, Gary Sommargren, Kenneth Goldberg, Patrick Naulleau, David Attwood, Eric Gullikson
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472328
KEYWORDS: Semiconducting wafers, Sensors, Extreme ultraviolet, Reticles, Projection systems, Extreme ultraviolet lithography, Printing, Lithography, Fiber optic illuminators, Wavefronts
Showing 5 of 6 publications
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