Gisung Yoon
Principal Engineer at Micron Technology Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 1 December 2022 Presentation + Paper
Adam Lyons, Tom Wallow, Dong-Seok Nam, Gisung Yoon, Baorui Yang, Mike Hermes
Proceedings Volume 12293, 122930M (2022) https://doi.org/10.1117/12.2643523
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Reticles, Stochastic processes, Metrology, Extreme ultraviolet lithography, Image analysis

Proceedings Article | 13 June 2022 Presentation
Chami Perera, Gi Sung Yoon, Ryan Carlson, Baorui Yang, Mike Hermes, Dave Houser, Alexander Khodarev, Chuck Murray, Travis Grodt, Arnaud Allézy, Weilun Chao, Farhad Salmassi, Eric Gullikson, Patrick Naulleau
Proceedings Volume PC12051, PC120510E (2022) https://doi.org/10.1117/12.2617277
KEYWORDS: Extreme ultraviolet, Photomasks, Reticles, Microscopes, Imaging systems, Zone plates, Semiconductors, Semiconducting wafers, Patents, Metrology

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 963520 (2015) https://doi.org/10.1117/12.2202511
KEYWORDS: Inspection, Photomasks, Defect inspection, Liquids, Coating, Image processing, Neodymium, Extreme ultraviolet, Semiconducting wafers, Optical properties

Proceedings Article | 8 October 2014 Paper
Sang Hoon Han, Hong Yul Jung, Sun Pyo Lee, In-Yong Kang, Gi Sung Yoon, Dong Hoon Chung, Chan-Uk Jeon, Yulia Brand, Yair Eran, Yoad Bar-Shean, Alexander Chereshnya, Chung Ki Lyu
Proceedings Volume 9235, 92351K (2014) https://doi.org/10.1117/12.2076308
KEYWORDS: Inspection, SRAF, Photomasks, Artificial intelligence, Optical proximity correction, Evolutionary algorithms, Resolution enhancement technologies, Image resolution, Optical lithography, Source mask optimization

Proceedings Article | 1 October 2013 Paper
In Yong Kang, Gisung Yoon, Jonghee Lee, Donghoon Paul Chung, Byung-Gook Kim, Chan-Uk Jeon, Gregg Inderhees, Trent Hutchinson, Wonil Cho, Jiuk Hur
Proceedings Volume 8886, 88860O (2013) https://doi.org/10.1117/12.2030976
KEYWORDS: Inspection, Photomasks, SRAF, Printing, Source mask optimization, Calibration, Model-based design, Scanners, Lithography, Image processing

Showing 5 of 10 publications
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