Guo-Tsai Huang
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 26 March 2019 Presentation + Paper
Simon Mathijssen, Marc Noot, Murat Bozkurt, Narjes Javaheri, Reza Hajiahmadi, Antonios Zagaris, Ken Chang, Benny Gosali, Eason Su, Cathy Wang, Arie den Boef, Kaustuve Bhattacharyya, Guo-Tsai Huang, Kai-Hsiung Chen, John Lin
Proceedings Volume 10959, 109591G (2019) https://doi.org/10.1117/12.2514949
KEYWORDS: Overlay metrology, Semiconducting wafers, Diffraction gratings, Scanning electron microscopy, Diffraction, Etching, Target detection, Sensors, Metrology, Switching

Proceedings Article | 13 March 2018 Presentation + Paper
Kaustuve Bhattacharyya, Marc Noot, Hammer Chang, Sax Liao, Ken Chang, Benny Gosali, Eason Su, Cathy Wang, Arie den Boef, Christophe Fouquet, Guo-Tsai Huang, Kai-Hsiung Chen, Kevin Cheng, John Lin
Proceedings Volume 10585, 105851F (2018) https://doi.org/10.1117/12.2297420
KEYWORDS: Overlay metrology, Semiconducting wafers, Etching, Polarization, Metrology, Scanning electron microscopy, Physics, Signal processing, Monte Carlo methods, Semiconductor manufacturing

Proceedings Article | 28 March 2017 Paper
Kai-Hsiung Chen, Guo-Tsai Huang, Hung-Chih Hsieh, Wei-Feng Ni, S. M. Chuang, T. K. Chuang, Chih-Ming Ke, Jacky Huang, Shiuan-An Rao, Aysegul Cumurcu Gysen, Maxime d'Alfonso, Jenny Yueh, Pavel Izikson, Aileen Soco, Jon Wu, Tjitte Nooitgedagt, Jeroen Ottens, Yong Ho Kim, Martin Ebert
Proceedings Volume 10145, 1014528 (2017) https://doi.org/10.1117/12.2257894
KEYWORDS: Overlay metrology, Metrology, High volume manufacturing, Scatterometry, Diffraction, Optical metrology, Lithography, Process control, Optical lithography, Time metrology, Image registration, Target acquisition, Semiconducting wafers

Proceedings Article | 28 March 2017 Presentation + Paper
Kaustuve Bhattacharyya, Arie den Boef, Marc Noot, Omer Adam, Grzegorz Grzela, Andreas Fuchs, Martin Jak, Sax Liao, Ken Chang, Vincent Couraudon, Eason Su, Wilson Tzeng, Cathy Wang, Christophe Fouquet, Guo-Tsai Huang, Kai-Hsiung Chen, Y. C. Wang, Kevin Cheng, Chih-Ming Ke, L. G. Terng
Proceedings Volume 10145, 101450A (2017) https://doi.org/10.1117/12.2257662
KEYWORDS: Overlay metrology, Polarization, Semiconducting wafers, Defense systems, Process control, Wafer-level optics, Diffraction gratings, Solids, Metrology, Image quality, Target detection, Detection and tracking algorithms, Diffraction, Thin films

Proceedings Article | 2 April 2014 Paper
Kai-Hsiung Chen, GT Huang, KS Chen, C. Hsieh, YC Chen, CM Ke, TS Gau, YC Ku, Kaustuve Bhattacharyya, Jacky Huang, Arie den Boef, Maurits v. d. Schaar, Martijn Maassen, Reinder Plug, Youping Zhang, Steffen Meyer, Martijn van Veen, Chris de Ruiter, Jon Wu, Hua Xu, Tatung Chow, Charlie Chen, Eric Verhoeven, Pu Li, Paul Hinnen, Greet Storms, Kelvin Pao, Gary Zhang, Christophe Fouquet, Takuya Mori
Proceedings Volume 9050, 90500S (2014) https://doi.org/10.1117/12.2047098
KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Back end of line, Scanners, Diffraction, Front end of line, Process control, Etching

Showing 5 of 13 publications
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