Jenny Yueh
Application Engineer at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2020 Presentation + Paper
Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara
Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246
KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

Proceedings Article | 28 March 2017 Paper
Kai-Hsiung Chen, Guo-Tsai Huang, Hung-Chih Hsieh, Wei-Feng Ni, S. M. Chuang, T. K. Chuang, Chih-Ming Ke, Jacky Huang, Shiuan-An Rao, Aysegul Cumurcu Gysen, Maxime d'Alfonso, Jenny Yueh, Pavel Izikson, Aileen Soco, Jon Wu, Tjitte Nooitgedagt, Jeroen Ottens, Yong Ho Kim, Martin Ebert
Proceedings Volume 10145, 1014528 (2017) https://doi.org/10.1117/12.2257894
KEYWORDS: Overlay metrology, Metrology, High volume manufacturing, Scatterometry, Diffraction, Optical metrology, Lithography, Process control, Optical lithography, Time metrology, Image registration, Target acquisition, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top