Dr. Young Jong Park
Application Engineer at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2020 Presentation + Paper
Jaeseung Jeong, Jinho Lee, Jinsun Kim, Sunyoung Yea, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Peter Nikolsky, Daniel Park, Antonio Corradi, Hyun-Woo Yu, Sun-Wook Jung, Denis Ovchinnikov, Vadim Timoshkov, Isabel de la Fuente Valentin, Yuxiang Yin, Kaustubh Padhye, Wim Tel, Harm Dillen, Koen Thuijs, Daan Slotboom, Miao Wang, Rhys Su, Marc Kea, Jin-Woo Lee, Yun-A Sung, Sang-Uk Kim, Young-Hoon Song, James Lee, Oh-Sung Kwon
Proceedings Volume 11325, 1132506 (2020) https://doi.org/10.1117/12.2551997
KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Optical lithography, Etching, Lithography, Edge roughness

Proceedings Article | 20 March 2020 Presentation + Paper
Proceedings Volume 11325, 113251J (2020) https://doi.org/10.1117/12.2551676
KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Metrology, Diffraction gratings, Polarization, Optical testing, Etching, Electronics, Optical lithography

Proceedings Article | 20 March 2020 Presentation + Paper
Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara
Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246
KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

Proceedings Article | 1 May 2018 Presentation + Paper
Proceedings Volume 10583, 105830X (2018) https://doi.org/10.1117/12.2299322
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet, Stochastic processes, Diffraction, Compact discs, Diffraction gratings, Cadmium, Lithographic illumination

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10587, 105870B (2018) https://doi.org/10.1117/12.2297513
KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Data modeling, Lithography, Optical alignment, Instrument modeling, Physics, Computing systems, Nanofabrication

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